Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Frederik Bijkerk; Wilfred Gerard van der Wiel; R. van der Meer; P.E. Hegeman

Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Frederik Bijkerk (Inventor)
, Wilfred Gerard van der Wiel (Inventor)
, R. van der Meer (Inventor)
, P.E. Hegeman (Inventor)

Research output: Patent

Original language	English
Patent number	10769182.3
Publication status	Submitted - 2010

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

METIS-316945

Cite this

@misc{c3d7dde50a8f4c6395bccc9ad93a1e73,

title = "Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method",

keywords = "METIS-316945",

author = "Frederik Bijkerk and \{van der Wiel\}, \{Wilfred Gerard\} and \{van der Meer\}, R. and P.E. Hegeman",

year = "2010",

language = "English",

type = "Patent",

note = "10769182.3",

}