In this review, for a variety of metals and semiconductors, an attempt is made to generalize observations in the literature on the effect of process conditions applied during photodeposition on (i) particle size distributions, (ii) oxidation states of the metals obtained, and (iii) consequences for photocatalytic activities. Process parameters include presence or absence of (organic) sacrificial agents, applied pH, presence or absence of an air/inert atmosphere, metal precursor type and concentration, and temperature. Most intensively reviewed are studies concerning (i) TiO2; (ii) ZnO, focusing on Ag deposition; (iii) WO3, with a strong emphasis on the photodeposition of Pt; and (iv) CdS, again with a focus on deposition of Pt. Furthermore, a detailed overview is given of achievements in structure-directed photodeposition, which could ultimately be employed to obtain highly effective photocatalytic materials. Finally, we provide suggestions for improvements in description of the photodeposition methods applied when included in scientific papers.