Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface

N. Tomczak; Gyula J. Vancso

doi:10.1016/j.eurpolymj.2007.02.027

Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface

N. Tomczak, Gyula J. Vancso

Research output: Contribution to journal › Article › Academic › peer-review

5 Citations (Scopus)

3 Downloads (Pure)

Abstract

Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm2 to mm2 areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate

Original language	Undefined
Pages (from-to)	1595-1601
Number of pages	7
Journal	European polymer journal
Volume	43
Issue number	5
DOIs	https://doi.org/10.1016/j.eurpolymj.2007.02.027
Publication status	Published - 2007

Keywords

IR-74856
METIS-240353

Access to Document

10.1016/j.eurpolymj.2007.02.027

Cite this

@article{e2a1f4eb548d40c2ac8c1c8041069f8a,

title = "Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface",

abstract = "Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm2 to mm2 areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate",

keywords = "IR-74856, METIS-240353",

author = "N. Tomczak and Vancso, {Gyula J.}",

year = "2007",

doi = "10.1016/j.eurpolymj.2007.02.027",

language = "Undefined",

volume = "43",

pages = "1595--1601",

journal = "European polymer journal",

issn = "0014-3057",

publisher = "Elsevier Ltd",

number = "5",

}

TY - JOUR

T1 - Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface

AU - Tomczak, N.

AU - Vancso, Gyula J.

PY - 2007

Y1 - 2007

N2 - Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm2 to mm2 areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate

AB - Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm2 to mm2 areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate

KW - IR-74856

KW - METIS-240353

U2 - 10.1016/j.eurpolymj.2007.02.027

DO - 10.1016/j.eurpolymj.2007.02.027

M3 - Article

SN - 0014-3057

VL - 43

SP - 1595

EP - 1601

JO - European polymer journal

JF - European polymer journal

IS - 5

ER -