Microcontact printing and pattern transfer with a tri-layer processing

Y. Chen, A. Lebib, F. Carcenac, H. Launois, G. Schmidt, M. Tormen, G. Muller, L.W. Molenkamp, M. Liebau, Jurriaan Huskens, David Reinhoudt

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9 Citations (Scopus)

Abstract

We describe a new approach of microcontact printing which is based on a tri-layer processing. The replication process has four steps: (1) preparation of gold-PMMA-substrate by sputtering and spincoating deposition; (2) pattern transfer with alkanethiol molecules from a PDMS stamp to gold; (3) wet etching of gold and (4) reactive ion etching of under-layer PMMA. By this method, we succeeded in fabricating microstructures in PMMA resist which are suitable for further hard material pattern transfers, thereby providing an enhanced process compatibility with most of microfabrication steps
Original languageUndefined
Pages (from-to)253-256
JournalMicroelectronic engineering
Volume53
Issue number1-4
DOIs
Publication statusPublished - 2000

Keywords

  • IR-59463

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