Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud, G.J. Veldhuis, Johan W. Berenschot, A.J. Nijdam, Hugo Hoekstra, O. Parriaux, Paul Lambeck

    Research output: Contribution to journalArticleAcademicpeer-review

    15 Citations (Scopus)

    Abstract

    A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.
    Original languageUndefined
    Pages (from-to)308-310
    Number of pages3
    JournalIEEE photonics technology letters
    Volume12
    Issue number3
    DOIs
    Publication statusPublished - 2000

    Keywords

    • METIS-112088
    • IR-97949

    Cite this

    Pandraud, G., Veldhuis, G. J., Berenschot, J. W., Nijdam, A. J., Hoekstra, H., Parriaux, O., & Lambeck, P. (2000). Micromachining of high-contrast optical waveguides in silicon wafers. IEEE photonics technology letters, 12(3), 308-310. https://doi.org/10.1109/68.826923