Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud; G.J. Veldhuis; Johan W. Berenschot; A.J. Nijdam; Hugo Hoekstra; O. Parriaux; Paul Lambeck

doi:10.1109/68.826923

Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud, G.J. Veldhuis, Johan W. Berenschot, A.J. Nijdam, Hugo Hoekstra, O. Parriaux, Paul Lambeck

Research output: Contribution to journal › Article › Academic › peer-review

16 Citations (Scopus)

Abstract

A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

Original language	Undefined
Pages (from-to)	308-310
Number of pages	3
Journal	IEEE photonics technology letters
Volume	12
Issue number	3
DOIs	https://doi.org/10.1109/68.826923
Publication status	Published - 2000

Keywords

METIS-112088
IR-97949

Access to Document

10.1109/68.826923

Cite this

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title = "Micromachining of high-contrast optical waveguides in silicon wafers",

abstract = "A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.",

keywords = "METIS-112088, IR-97949",

author = "G. Pandraud and G.J. Veldhuis and Berenschot, {Johan W.} and A.J. Nijdam and Hugo Hoekstra and O. Parriaux and Paul Lambeck",

year = "2000",

doi = "10.1109/68.826923",

language = "Undefined",

volume = "12",

pages = "308--310",

journal = "IEEE photonics technology letters",

issn = "1041-1135",

publisher = "IEEE",

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T1 - Micromachining of high-contrast optical waveguides in silicon wafers

AU - Pandraud, G.

AU - Veldhuis, G.J.

AU - Berenschot, Johan W.

AU - Nijdam, A.J.

AU - Hoekstra, Hugo

AU - Parriaux, O.

AU - Lambeck, Paul

PY - 2000

Y1 - 2000

N2 - A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

AB - A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

KW - METIS-112088

KW - IR-97949

U2 - 10.1109/68.826923

DO - 10.1109/68.826923

M3 - Article

VL - 12

SP - 308

EP - 310

JO - IEEE photonics technology letters

JF - IEEE photonics technology letters

SN - 1041-1135

IS - 3

ER -