Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud; G.J. Veldhuis; Johan W. Berenschot; A.J. Nijdam; Hugo Hoekstra; O. Parriaux; Paul Lambeck

doi:10.1109/68.826923

Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud, G.J. Veldhuis, Johan W. Berenschot, A.J. Nijdam, Hugo Hoekstra, O. Parriaux, Paul Lambeck

Research output: Contribution to journal › Article › Academic › peer-review

15 Citations (Scopus)

Abstract

A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

Original language	Undefined
Pages (from-to)	308-310
Number of pages	3
Journal	IEEE photonics technology letters
Volume	12
Issue number	3
DOIs	https://doi.org/10.1109/68.826923
Publication status	Published - 2000

Keywords

METIS-112088
IR-97949

Cite this

Pandraud, G., Veldhuis, G. J., Berenschot, J. W., Nijdam, A. J., Hoekstra, H., Parriaux, O., & Lambeck, P. (2000). Micromachining of high-contrast optical waveguides in silicon wafers. IEEE photonics technology letters, 12(3), 308-310. https://doi.org/10.1109/68.826923

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AU - Hoekstra, Hugo

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AU - Lambeck, Paul

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Access to Document

10.1109/68.826923