Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud; G.J. Veldhuis; Johan W. Berenschot; A.J. Nijdam; Hugo Hoekstra; O. Parriaux; Paul Lambeck

doi:10.1109/68.826923

Micromachining of high-contrast optical waveguides in silicon wafers

G. Pandraud
, G.J. Veldhuis
, Johan W. Berenschot
, A.J. Nijdam
, Hugo Hoekstra
, O. Parriaux
, Paul Lambeck

Research output: Contribution to journal › Article › Academic › peer-review

17 Citations (Scopus)

6 Downloads (Pure)

Abstract

A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

Original language	English
Pages (from-to)	308-310
Number of pages	3
Journal	IEEE photonics technology letters
Volume	12
Issue number	3
DOIs	https://doi.org/10.1109/68.826923
Publication status	Published - 2000

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

METIS-112088
IR-97949

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10.1109/68.826923

Cite this

@article{e5b4e25790fa4372b289717c0ba80060,

title = "Micromachining of high-contrast optical waveguides in silicon wafers",

abstract = "A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.",

keywords = "METIS-112088, IR-97949",

author = "G. Pandraud and G.J. Veldhuis and Berenschot, \{Johan W.\} and A.J. Nijdam and Hugo Hoekstra and O. Parriaux and Paul Lambeck",

year = "2000",

doi = "10.1109/68.826923",

language = "English",

volume = "12",

pages = "308--310",

journal = "IEEE photonics technology letters",

issn = "1041-1135",

publisher = "IEEE",

number = "3",

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T1 - Micromachining of high-contrast optical waveguides in silicon wafers

AU - Pandraud, G.

AU - Veldhuis, G.J.

AU - Berenschot, Johan W.

AU - Nijdam, A.J.

AU - Hoekstra, Hugo

AU - Parriaux, O.

AU - Lambeck, Paul

PY - 2000

Y1 - 2000

N2 - A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

AB - A fabrication technique by KOH etching for very thin free standing plane parallel silicon bridges in a <111> silicon wafer is presented. The applications of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.

KW - METIS-112088

KW - IR-97949

U2 - 10.1109/68.826923

DO - 10.1109/68.826923

M3 - Article

SN - 1041-1135

VL - 12

SP - 308

EP - 310

JO - IEEE photonics technology letters

JF - IEEE photonics technology letters

IS - 3

ER -

Micromachining of high-contrast optical waveguides in silicon wafers

Abstract

UN SDGs

Keywords

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