Micrometer and nanometer-scale parallel patterning of ceramic and organic-inorganic hybrid materials

Johan E. ten Elshof, Sajid Khan, Ole Göbel

Research output: Contribution to journalArticleAcademicpeer-review

49 Citations (Scopus)

Abstract

This review gives an overview of the progress made in recent years in the development of low-cost parallel patterning techniques for ceramic materials, silica, and organic–inorganic silsesquioxane-based hybrids from wet-chemical solutions and suspensions on the micrometer and nanometer-scale. The emphasis of the discussion is placed on the application of soft-lithographic methods, but photolithography-aided patterning methods for oxide film growth are also discussed. In general, moulding-based patterning approaches and surface modification-based patterning approaches can be distinguished. Lateral resolutions well below 100 nm have been accomplished with some of these methods, but the fabrication of high-aspect ratio patterns remains a challenge.
Original languageEnglish
Pages (from-to)1555-1577
Number of pages23
JournalJournal of the European Ceramic Society
Volume30
Issue number7
DOIs
Publication statusPublished - 2010

Keywords

  • IR-86683
  • Ceramic
  • Moulding
  • METIS-269423
  • Soft Lithography
  • Thin film
  • Patterning

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