Microsieves made with laser interference lithography for micro-filtration applications

C.J.M. van Rijn; W. Nijdam; S. Kuiper; G.J. Veldhuis; Hendricus A.G.M. van Wolferen; Michael Curt Elwenspoek

doi:10.1088/0960-1317/9/2/316

Microsieves made with laser interference lithography for micro-filtration applications

C.J.M. van Rijn, W. Nijdam, S. Kuiper, G.J. Veldhuis, Hendricus A.G.M. van Wolferen, Michael Curt Elwenspoek

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.

Original language	Undefined
Pages (from-to)	170-172
Number of pages	3
Journal	Journal of micromechanics and microengineering
Volume	9
Issue number	2
DOIs	https://doi.org/10.1088/0960-1317/9/2/316
Publication status	Published - Jun 1999

Keywords

METIS-111688
IR-14592
EWI-13214

Access to Document

10.1088/0960-1317/9/2/316

http://eprints.eemcs.utwente.nl/secure2/13214/01/JMM_9_170.pdf

Cite this

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title = "Microsieves made with laser interference lithography for micro-filtration applications",

abstract = "A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.",

keywords = "METIS-111688, IR-14592, EWI-13214",

author = "{van Rijn}, C.J.M. and W. Nijdam and S. Kuiper and G.J. Veldhuis and {van Wolferen}, {Hendricus A.G.M.} and Elwenspoek, {Michael Curt}",

year = "1999",

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T1 - Microsieves made with laser interference lithography for micro-filtration applications

AU - van Rijn, C.J.M.

AU - Nijdam, W.

AU - Kuiper, S.

AU - Veldhuis, G.J.

AU - van Wolferen, Hendricus A.G.M.

AU - Elwenspoek, Michael Curt

PY - 1999/6

Y1 - 1999/6

N2 - A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.

AB - A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.

KW - METIS-111688

KW - IR-14592

KW - EWI-13214

U2 - 10.1088/0960-1317/9/2/316

DO - 10.1088/0960-1317/9/2/316

M3 - Article

SN - 0960-1317

VL - 9

SP - 170

EP - 172

JO - Journal of micromechanics and microengineering

JF - Journal of micromechanics and microengineering

IS - 2

ER -