Microsieves made with laser interference lithography for micro-filtration applications

C.J.M. van Rijn, W. Nijdam, S. Kuiper, G.J. Veldhuis, Hendricus A.G.M. van Wolferen, Michael Curt Elwenspoek

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    A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.
    Original languageUndefined
    Pages (from-to)170-172
    Number of pages3
    JournalJournal of micromechanics and microengineering
    Issue number2
    Publication statusPublished - Jun 1999


    • METIS-111688
    • IR-14592
    • EWI-13214

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