TY - JOUR
T1 - Microstructuring glass surfaces using a combined masking and microslurry-jet machining process
AU - Nakanishi, Yoshitaka
AU - Nakashima, Yuta
AU - van der Heide, Emile
PY - 2021/1
Y1 - 2021/1
N2 - The combined application of a conventional photoresist masking process and microslurry-jet (MSJ) mechanical removal process was studied for microstructuring the surface of glass. Masking patterns made of a photocurable resin (SU-8) were created on the glass, and both the SU-8 patterns and exposed glass surface were simultaneously removed using the MSJ. When the sacrificial patterns of the SU-8 were removed by the MSJ, the glass surface with microstructures was created. Post-treatment, such as removal of the SU-8 patterns, was not required. Confocal microscopy results confirmed that continuously curved convex structures up to 30 μm in diameter and 4 μm in height with highly transparent glass surfaces were created. The microstructures reduced the hydrophilicity of the glass surfaces. Future studies on identifying materials compatible with glass for making masking patterns and showing good wear resistance might prove the feasibility of this method in producing structured engineering surfaces.
AB - The combined application of a conventional photoresist masking process and microslurry-jet (MSJ) mechanical removal process was studied for microstructuring the surface of glass. Masking patterns made of a photocurable resin (SU-8) were created on the glass, and both the SU-8 patterns and exposed glass surface were simultaneously removed using the MSJ. When the sacrificial patterns of the SU-8 were removed by the MSJ, the glass surface with microstructures was created. Post-treatment, such as removal of the SU-8 patterns, was not required. Confocal microscopy results confirmed that continuously curved convex structures up to 30 μm in diameter and 4 μm in height with highly transparent glass surfaces were created. The microstructures reduced the hydrophilicity of the glass surfaces. Future studies on identifying materials compatible with glass for making masking patterns and showing good wear resistance might prove the feasibility of this method in producing structured engineering surfaces.
KW - Glass
KW - Mechanical removal process
KW - Micromachining
KW - Microslurry-jet
KW - Photolithography
UR - http://www.scopus.com/inward/record.url?scp=85092024462&partnerID=8YFLogxK
U2 - 10.1016/j.precisioneng.2020.09.018
DO - 10.1016/j.precisioneng.2020.09.018
M3 - Article
AN - SCOPUS:85092024462
VL - 67
SP - 172
EP - 177
JO - Precision engineering
JF - Precision engineering
SN - 0141-6359
ER -