Abstract
The combined application of a conventional photoresist masking process and microslurry-jet (MSJ) mechanical removal process was studied for microstructuring the surface of glass. Masking patterns made of a photocurable resin (SU-8) were created on the glass, and both the SU-8 patterns and exposed glass surface were simultaneously removed using the MSJ. When the sacrificial patterns of the SU-8 were removed by the MSJ, the glass surface with microstructures was created. Post-treatment, such as removal of the SU-8 patterns, was not required. Confocal microscopy results confirmed that continuously curved convex structures up to 30 μm in diameter and 4 μm in height with highly transparent glass surfaces were created. The microstructures reduced the hydrophilicity of the glass surfaces. Future studies on identifying materials compatible with glass for making masking patterns and showing good wear resistance might prove the feasibility of this method in producing structured engineering surfaces.
| Original language | English |
|---|---|
| Pages (from-to) | 172-177 |
| Number of pages | 6 |
| Journal | Precision engineering |
| Volume | 67 |
| Early online date | 28 Sept 2020 |
| DOIs | |
| Publication status | Published - Jan 2021 |
Keywords
- 2022 OA procedure
- Mechanical removal process
- Micromachining
- Microslurry-jet
- Photolithography
- Glass