Microwave plasma emerging technologies for chemical processes

Javier F. de la Fuente, Anton A. Kiss, Marilena T. Radoiu, Georgios D. Stefanidis*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

8 Citations (Scopus)

Abstract

Microwave plasma (MWP) technology is currently being used in application fields such as semiconductor and material processing, diamond film deposition and waste remediation. Specific advantages of the technology include the enablement of a high energy density source and a highly reactive medium, operational flexibility, fast response time to inlet variations and low maintenance costs. These aspects make MWP a promising alternative technology to conventional thermal chemical reactors provided that certain technical and operational challenges related to scalability are overcome. Herein, an overview of state-of-the-art applications of MWP in chemical processing is presented (e.g. stripping of photo resist, UV-disinfection, waste gas treatment, plasma reforming, methane coupling to olefins, coal/biomass/waste pyrolysis/gasification and CO2 conversion). In addition, two potential approaches to tackle scalability limitations are described, namely the development of a single unit microwave generator with high output power (>100 kW), and the coupling of multiple microwave generators with a single reactor chamber. Finally, the fundamental and engineering challenges to enable profitable implementation of the MWP technology at large scale are discussed.

Original languageEnglish
Pages (from-to)2495-2505
Number of pages11
JournalJournal of chemical technology and biotechnology
Volume92
Issue number10
DOIs
Publication statusPublished - 1 Oct 2017

Keywords

  • emerging technologies
  • industrial applications
  • microwave plasma
  • roadmap

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    de la Fuente, J. F., Kiss, A. A., Radoiu, M. T., & Stefanidis, G. D. (2017). Microwave plasma emerging technologies for chemical processes. Journal of chemical technology and biotechnology, 92(10), 2495-2505. https://doi.org/10.1002/jctb.5205