Mirror, in particular for a microlithographic projection exposure system

Ben Wylie-Van Eerd (Inventor), Frederik Bijkerk (Inventor), Kerstin Hild (Inventor), Toralf Gruner (Inventor), Stefan Schulte (Inventor), Simone Weyler (Inventor)

Research output: Patent

Abstract

The invention relates to a mirror, in particular for a microlithographic projection exposure system, comprising a mirror substrate (12, 32, 52), which mirror has a reflection layer stack (21, 41, 61) for reflecting electromagnetic radiation of a working wavelength hitting the optical active surface (11, 31, 51) and has at least one piezoelectric layer (16, 36, 56), which is arranged between the mirror substrate and the reflection layer stack and to which an electric field for producing locally variable deformation can be applied by means of a first electrode arrangement (20, 40, 60) located on the side of the piezoelectric layer facing the reflection layer stack and by means of a second electrode arrangement (14, 34, 54) located on the side of the piezoelectric layer facing the mirror substrate. According to one aspect, a bracing layer (98) is provided, which reduces a sinking of the piezoelectric layer (96) into the mirror substrate (92) accompanying the application of an electric field in comparison with an analogous design without the bracing layer and thus increases the effective deflection of the piezoelectric layer (96).

Original languageEnglish
Patent numberWO2019029990
IPCG21K 1/ 06 A I
Priority date9/08/17
Publication statusPublished - 14 Feb 2019

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