Modeling and chemical vapor deposition in a fluidized bed reactor based on discrete particle simulation

Ggregor Czok, M. Ye, Martin Anton van der Hoef, J.A.M. Kuipers, Joachim Werther

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    For better understanding the process of particle coating by chemical vapor deposition (CVD) in the fluidized bed, the simulation of the deposition process was combined with a discrete particle model (DPM). Based on the experimental results of the thermal decomposition of tri-isobutyl-aluminum (TIBA) to produce aluminum onto glass beads, mechanisms on the micro-scale were investigated by single particle tracking. Zones of excessive growth as well as zones of insufficient mixing were identified. In particular, the take-up of aluminum was traced for selected particles that exhibited a large mass of deposited aluminum what in turn provides insight into the homogeneity and quantity of the coating throughout the bed material.
    Original languageUndefined
    Pages (from-to)-
    JournalInternational journal of chemical reactor engineering
    Issue numberA57
    Publication statusPublished - 2005


    • IR-54603
    • METIS-228902

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