Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures

C.G. Bostan; R.M. de Ridder; I. van Dorssen; Hendricus A.G.M. van Wolferen; L. Kuipers; N.F. van Hulst

doi:10.1109/ICTON.2002.1007851

Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures

C.G. Bostan, R.M. de Ridder, I. van Dorssen, Hendricus A.G.M. van Wolferen, L. Kuipers, N.F. van Hulst

Optical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

190 Downloads (Pure)

Abstract

Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes

Original language	Undefined
Title of host publication	Proceedings ICTON 2002
Pages	61-61
Number of pages	1
DOIs	https://doi.org/10.1109/ICTON.2002.1007851
Publication status	Published - 21 Apr 2002
Event	4th International Conference on Transparent Optical Networks, ICTON 2002 - Warsaw, Poland Duration: 21 Apr 2002 → 25 Apr 2002 Conference number: 4

Conference

Conference	4th International Conference on Transparent Optical Networks, ICTON 2002
Abbreviated title	ICTON
Country/Territory	Poland
City	Warsaw
Period	21/04/02 → 25/04/02

Keywords

IR-44028
METIS-208229

Access to Document

10.1109/ICTON.2002.1007851

01007851

Cite this

@inproceedings{6468d559c85e41e2af0175a138094bcf,

title = "Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures",

abstract = "Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes",

keywords = "IR-44028, METIS-208229",

author = "C.G. Bostan and {de Ridder}, R.M. and {van Dorssen}, I. and {van Wolferen}, {Hendricus A.G.M.} and L. Kuipers and {van Hulst}, N.F.",

note = "Cat. Nr. 02EX551 ; 4th International Conference on Transparent Optical Networks, ICTON 2002 ; Conference date: 21-04-2002 Through 25-04-2002",

year = "2002",

month = apr,

day = "21",

doi = "10.1109/ICTON.2002.1007851",

language = "Undefined",

isbn = "0-7803-7375-8",

pages = "61--61",

booktitle = "Proceedings ICTON 2002",

}

Bostan, CG, de Ridder, RM, van Dorssen, I, van Wolferen, HAGM, Kuipers, L & van Hulst, NF 2002, Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures. in Proceedings ICTON 2002. pp. 61-61, 4th International Conference on Transparent Optical Networks, ICTON 2002, Warsaw, Poland, 21/04/02. https://doi.org/10.1109/ICTON.2002.1007851

TY - GEN

T1 - Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures

AU - Bostan, C.G.

AU - de Ridder, R.M.

AU - van Dorssen, I.

AU - van Wolferen, Hendricus A.G.M.

AU - Kuipers, L.

AU - van Hulst, N.F.

N1 - Conference code: 4

PY - 2002/4/21

Y1 - 2002/4/21

N2 - Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes

AB - Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes

KW - IR-44028

KW - METIS-208229

U2 - 10.1109/ICTON.2002.1007851

DO - 10.1109/ICTON.2002.1007851

M3 - Conference contribution

SN - 0-7803-7375-8

SP - 61

EP - 61

BT - Proceedings ICTON 2002

T2 - 4th International Conference on Transparent Optical Networks, ICTON 2002

Y2 - 21 April 2002 through 25 April 2002

ER -