Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures

C.G. Bostan, R.M. de Ridder, I. van Dorssen, Hendricus A.G.M. van Wolferen, L. Kuipers, N.F. van Hulst

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Abstract

Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes
Original languageUndefined
Title of host publicationProceedings ICTON 2002
Pages61-61
Number of pages1
DOIs
Publication statusPublished - 21 Apr 2002
Event4th International Conference on Transparent Optical Networks, ICTON 2002 - Warsaw, Poland
Duration: 21 Apr 200225 Apr 2002
Conference number: 4

Conference

Conference4th International Conference on Transparent Optical Networks, ICTON 2002
Abbreviated titleICTON
CountryPoland
CityWarsaw
Period21/04/0225/04/02

Keywords

  • IR-44028
  • METIS-208229

Cite this

Bostan, C. G., de Ridder, R. M., van Dorssen, I., van Wolferen, H. A. G. M., Kuipers, L., & van Hulst, N. F. (2002). Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures. In Proceedings ICTON 2002 (pp. 61-61) https://doi.org/10.1109/ICTON.2002.1007851