Modeling of XUV-induced damage in Ru films: The role of model parameters

Igor Milov*, Vladimir Lipp, Nikita Medvedev, Igor A. Makhotkin, Eric Louis, Fred Bijkerk

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

4 Citations (Scopus)
62 Downloads (Pure)

Abstract

We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-Temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electronphonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.

Original languageEnglish
Pages (from-to)B43-B53
Number of pages11
JournalJournal of the Optical Society of America B: Optical Physics
Volume35
Issue number10
DOIs
Publication statusPublished - 28 Sep 2018

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