Modeling of XUV-induced damage in Ru films: The role of model parameters

Igor Milov, Vladimir Lipp, Nikita Medvedev, Igor A. Makhotkin, Eric Louis, Fred Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)
42 Downloads (Pure)

Abstract

We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-Temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electronphonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.

Original languageEnglish
Pages (from-to)B43-B53
Number of pages11
JournalJournal of the Optical Society of America B: Optical Physics
Volume35
Issue number10
DOIs
Publication statusPublished - 28 Sep 2018

Fingerprint

damage
photoabsorption
hot electrons
ruthenium
electrons
thermal conductivity
temperature dependence
irradiation
heating
kinetics
thin films
approximation
excitation
temperature

Cite this

@article{53ab3f39f43f4d3380cfea3a49529847,
title = "Modeling of XUV-induced damage in Ru films: The role of model parameters",
abstract = "We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-Temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electronphonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.",
author = "Igor Milov and Vladimir Lipp and Nikita Medvedev and Makhotkin, {Igor A.} and Eric Louis and Fred Bijkerk",
year = "2018",
month = "9",
day = "28",
doi = "10.1364/JOSAB.35.000B43",
language = "English",
volume = "35",
pages = "B43--B53",
journal = "Journal of the Optical Society of America. B: Optical physics",
issn = "0740-3224",
publisher = "The Optical Society",
number = "10",

}

Modeling of XUV-induced damage in Ru films : The role of model parameters. / Milov, Igor; Lipp, Vladimir; Medvedev, Nikita; Makhotkin, Igor A.; Louis, Eric; Bijkerk, Fred.

In: Journal of the Optical Society of America B: Optical Physics, Vol. 35, No. 10, 28.09.2018, p. B43-B53.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Modeling of XUV-induced damage in Ru films

T2 - The role of model parameters

AU - Milov, Igor

AU - Lipp, Vladimir

AU - Medvedev, Nikita

AU - Makhotkin, Igor A.

AU - Louis, Eric

AU - Bijkerk, Fred

PY - 2018/9/28

Y1 - 2018/9/28

N2 - We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-Temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electronphonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.

AB - We perform a computational study of damage formation in extreme ultraviolet (XUV)-irradiated ruthenium thin films by means of combining the Monte Carlo approach with the two-Temperature model. The model predicts that the damage formation is most affected by ultrafast heating of the lattice by hot electrons, and is not very sensitive to the initial stage of the material excitation. Numerical parameters of the model were analyzed, as well as different approximations for the thermal parameters, showing the importance of the temperature dependence of the electron thermal conductivity and the electronphonon coupling factor. Our analysis reveals that the details of photoabsorption and ultrafast non-equilibrium electron kinetics play only a minor role in the XUV irradiation regime.

UR - http://www.scopus.com/inward/record.url?scp=85054513797&partnerID=8YFLogxK

U2 - 10.1364/JOSAB.35.000B43

DO - 10.1364/JOSAB.35.000B43

M3 - Article

VL - 35

SP - B43-B53

JO - Journal of the Optical Society of America. B: Optical physics

JF - Journal of the Optical Society of America. B: Optical physics

SN - 0740-3224

IS - 10

ER -