Modelling and analysis of CVD processes for ceramic membrane preparation

H.W. Brinkman; G.Z. Cao; J. Meijerink; Karel Jan de Vries; Anthonie Burggraaf

doi:10.1016/0167-2738(93)90083-F

Modelling and analysis of CVD processes for ceramic membrane preparation

H.W. Brinkman, G.Z. Cao, J. Meijerink, Karel Jan de Vries, Anthonie Burggraaf

Inorganic Materials Science

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Abstract

A mathematical model is presented that describes the modified chemical vapour deposition (CVD) process (which takes place in advance of the electrochemical vapour deposition (EVD) process) to deposit ZrO2 inside porous media for the preparation and modification of ceramic membranes. The isobaric model takes into account intrapore Knudsen diffusion of ZrCl4 and H2O, which enter the membrane from opposite sides, and Langmuir-Hinshelwood reaction of the solid product ZrO2 on the internal pore wall. The processes occurring in one single pore are investigated, and the change in pore geometry during deposition is taken into account. Based upon this model, the deposition profile is studied. The model fits reasonably well with experimental results.

Original language	English
Pages (from-to)	37-44
Number of pages	7
Journal	Solid state ionics
Volume	63-65
Issue number	63
DOIs	https://doi.org/10.1016/0167-2738(93)90083-F
Publication status	Published - 1993

Keywords

METIS-106838
IR-12657

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10.1016/0167-2738(93)90083-F

Brinkman93modelling

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title = "Modelling and analysis of CVD processes for ceramic membrane preparation",

abstract = "A mathematical model is presented that describes the modified chemical vapour deposition (CVD) process (which takes place in advance of the electrochemical vapour deposition (EVD) process) to deposit ZrO2 inside porous media for the preparation and modification of ceramic membranes. The isobaric model takes into account intrapore Knudsen diffusion of ZrCl4 and H2O, which enter the membrane from opposite sides, and Langmuir-Hinshelwood reaction of the solid product ZrO2 on the internal pore wall. The processes occurring in one single pore are investigated, and the change in pore geometry during deposition is taken into account. Based upon this model, the deposition profile is studied. The model fits reasonably well with experimental results.",

keywords = "METIS-106838, IR-12657",

author = "H.W. Brinkman and G.Z. Cao and J. Meijerink and {de Vries}, {Karel Jan} and Anthonie Burggraaf",

year = "1993",

doi = "10.1016/0167-2738(93)90083-F",

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TY - JOUR

T1 - Modelling and analysis of CVD processes for ceramic membrane preparation

AU - Brinkman, H.W.

AU - Cao, G.Z.

AU - Meijerink, J.

AU - de Vries, Karel Jan

AU - Burggraaf, Anthonie

PY - 1993

Y1 - 1993

N2 - A mathematical model is presented that describes the modified chemical vapour deposition (CVD) process (which takes place in advance of the electrochemical vapour deposition (EVD) process) to deposit ZrO2 inside porous media for the preparation and modification of ceramic membranes. The isobaric model takes into account intrapore Knudsen diffusion of ZrCl4 and H2O, which enter the membrane from opposite sides, and Langmuir-Hinshelwood reaction of the solid product ZrO2 on the internal pore wall. The processes occurring in one single pore are investigated, and the change in pore geometry during deposition is taken into account. Based upon this model, the deposition profile is studied. The model fits reasonably well with experimental results.

AB - A mathematical model is presented that describes the modified chemical vapour deposition (CVD) process (which takes place in advance of the electrochemical vapour deposition (EVD) process) to deposit ZrO2 inside porous media for the preparation and modification of ceramic membranes. The isobaric model takes into account intrapore Knudsen diffusion of ZrCl4 and H2O, which enter the membrane from opposite sides, and Langmuir-Hinshelwood reaction of the solid product ZrO2 on the internal pore wall. The processes occurring in one single pore are investigated, and the change in pore geometry during deposition is taken into account. Based upon this model, the deposition profile is studied. The model fits reasonably well with experimental results.

KW - METIS-106838

KW - IR-12657

U2 - 10.1016/0167-2738(93)90083-F

DO - 10.1016/0167-2738(93)90083-F

M3 - Article

SN - 0167-2738

VL - 63-65

SP - 37

EP - 44

JO - Solid state ionics

JF - Solid state ionics

IS - 63

ER -

Modelling and analysis of CVD processes for ceramic membrane preparation

Abstract

Keywords

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