Modelling and analysis of CVD processes for ceramic membrane preparation

H.W. Brinkman, G.Z. Cao, J. Meijerink, Karel Jan de Vries, Anthonie Burggraaf

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10 Citations (Scopus)
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A mathematical model is presented that describes the modified chemical vapour deposition (CVD) process (which takes place in advance of the electrochemical vapour deposition (EVD) process) to deposit ZrO2 inside porous media for the preparation and modification of ceramic membranes. The isobaric model takes into account intrapore Knudsen diffusion of ZrCl4 and H2O, which enter the membrane from opposite sides, and Langmuir-Hinshelwood reaction of the solid product ZrO2 on the internal pore wall. The processes occurring in one single pore are investigated, and the change in pore geometry during deposition is taken into account. Based upon this model, the deposition profile is studied. The model fits reasonably well with experimental results.
Original languageEnglish
Pages (from-to)37-44
Number of pages7
JournalSolid state ionics
Issue number63
Publication statusPublished - 1993


  • METIS-106838
  • IR-12657

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