Experiments on the modified chemical vapour deposition (CVD) and the electrochemical vapour deposition (EVD) of yttria-stabilized zirconia on porous substrates are reported. It is shown that, in the CVD stage, deposition occurs in a small (<20 um) region at the edge of the substrate, very likely leading to pore narrowing. This result illustrates the feasibility of the CVD technique for the modification of ceramic membranes to the (sub)nanometer scale. Film growth in the EVD stage is shown to be controlled by the inpore diffusion of the oxygen source reactant for short (<5 h) deposition times. The yttria to zirconia ratio in the deposited film is determined by the ratio present in the vapour phase. Very thin (<2 um) films can be deposited, which have a potential application in solid oxide fuel cells.