Moisture resistance of SU-8 and KMPR as structural material

V.M. Blanco Carballo, J. Melai, Cora Salm, Jurriaan Schmitz

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    This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.
    Original languageUndefined
    Article number10.1016/j.mee.2008.12.076
    Pages (from-to)765-768
    Number of pages4
    JournalMicroelectronic engineering
    Issue number4-6
    Publication statusPublished - 2009


    • KMPR
    • Moisture
    • Adhesion strength
    • EWI-15225
    • SC-RID: Radiation Imaging detectors
    • SU-8
    • CMOS post-processing
    • IR-62786
    • METIS-263780

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