Moisture resistance of SU-8 and KMPR as structural material

V.M. Blanco Carballo, J. Melai, Cora Salm, Jurriaan Schmitz

    Research output: Contribution to journalArticleAcademicpeer-review

    20 Citations (Scopus)

    Abstract

    This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.
    Original languageUndefined
    Article number10.1016/j.mee.2008.12.076
    Pages (from-to)765-768
    Number of pages4
    JournalMicroelectronic engineering
    Volume86
    Issue number4-6
    DOIs
    Publication statusPublished - 2009

    Keywords

    • KMPR
    • Moisture
    • Adhesion strength
    • EWI-15225
    • SC-RID: Radiation Imaging detectors
    • SU-8
    • CMOS post-processing
    • IR-62786
    • METIS-263780

    Cite this

    Blanco Carballo, V.M. ; Melai, J. ; Salm, Cora ; Schmitz, Jurriaan. / Moisture resistance of SU-8 and KMPR as structural material. In: Microelectronic engineering. 2009 ; Vol. 86, No. 4-6. pp. 765-768.
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    abstract = "This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.",
    keywords = "KMPR, Moisture, Adhesion strength, EWI-15225, SC-RID: Radiation Imaging detectors, SU-8, CMOS post-processing, IR-62786, METIS-263780",
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    Blanco Carballo, VM, Melai, J, Salm, C & Schmitz, J 2009, 'Moisture resistance of SU-8 and KMPR as structural material', Microelectronic engineering, vol. 86, no. 4-6, 10.1016/j.mee.2008.12.076, pp. 765-768. https://doi.org/10.1016/j.mee.2008.12.076

    Moisture resistance of SU-8 and KMPR as structural material. / Blanco Carballo, V.M.; Melai, J.; Salm, Cora; Schmitz, Jurriaan.

    In: Microelectronic engineering, Vol. 86, No. 4-6, 10.1016/j.mee.2008.12.076, 2009, p. 765-768.

    Research output: Contribution to journalArticleAcademicpeer-review

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    AU - Melai, J.

    AU - Salm, Cora

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    AB - This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.

    KW - KMPR

    KW - Moisture

    KW - Adhesion strength

    KW - EWI-15225

    KW - SC-RID: Radiation Imaging detectors

    KW - SU-8

    KW - CMOS post-processing

    KW - IR-62786

    KW - METIS-263780

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