Abstract
| Original language | Undefined |
|---|---|
| Article number | 10.1016/j.mee.2008.12.076 |
| Pages (from-to) | 765-768 |
| Number of pages | 4 |
| Journal | Microelectronic engineering |
| Volume | 86 |
| Issue number | 4-6 |
| DOIs | |
| Publication status | Published - 2009 |
Keywords
- KMPR
- Moisture
- Adhesion strength
- EWI-15225
- SC-RID: Radiation Imaging detectors
- SU-8
- CMOS post-processing
- IR-62786
- METIS-263780
Cite this
}
Moisture resistance of SU-8 and KMPR as structural material. / Blanco Carballo, V.M.; Melai, J.; Salm, Cora; Schmitz, Jurriaan.
In: Microelectronic engineering, Vol. 86, No. 4-6, 10.1016/j.mee.2008.12.076, 2009, p. 765-768.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Moisture resistance of SU-8 and KMPR as structural material
AU - Blanco Carballo, V.M.
AU - Melai, J.
AU - Salm, Cora
AU - Schmitz, Jurriaan
N1 - 10.1016/j.mee.2008.12.076
PY - 2009
Y1 - 2009
N2 - This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.
AB - This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application.
KW - KMPR
KW - Moisture
KW - Adhesion strength
KW - EWI-15225
KW - SC-RID: Radiation Imaging detectors
KW - SU-8
KW - CMOS post-processing
KW - IR-62786
KW - METIS-263780
U2 - 10.1016/j.mee.2008.12.076
DO - 10.1016/j.mee.2008.12.076
M3 - Article
VL - 86
SP - 765
EP - 768
JO - Microelectronic engineering
JF - Microelectronic engineering
SN - 0167-9317
IS - 4-6
M1 - 10.1016/j.mee.2008.12.076
ER -