This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after one day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application. © 2008 Elsevier Science. All rights reserved.
|Title of host publication||Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008)|
|Place of Publication||Utrecht, The Netherlands|
|Number of pages||4|
|Publication status||Published - 27 Nov 2008|
|Event||11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008 - Veldhoven, Netherlands|
Duration: 27 Nov 2008 → 28 Nov 2008
Conference number: 11
|Publisher||Technology Foundation STW|
|Workshop||11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2008|
|Period||27/11/08 → 28/11/08|
- SC-RID: Radiation Imaging detectors
Blanco Carballo, V. M., Melai, J., Salm, C., & Schmitz, J. (2008). Moisture resistance of SU-8 and KMPR as structural material for integrated gaseous detectors. In Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008) (pp. 395-398). Utrecht, The Netherlands: STW.