Monolithic Distributed Bragg Reﬂector Cavities in
Al2O3 with Quality Factors Exceeding 106

Edward Bernhardi; Q. Lu; Hendricus A.G.M. van Wolferen; Kerstin Worhoff; R.M. de Ridder; Markus Pollnau

doi:10.1016/j.photonics.2011.03.001

Monolithic Distributed Bragg Reﬂector Cavities in Al₂O₃ with Quality Factors Exceeding 10⁶

Edward Bernhardi, Q. Lu, Hendricus A.G.M. van Wolferen, Kerstin Worhoff, R.M. de Ridder, Markus Pollnau

Research output: Contribution to journal › Article › Academic › peer-review

31 Citations (Scopus)

Abstract

>The design, fabrication, and characterization of surface relief Bragg gratings integrated with aluminum oxide ridge waveguides are reported. After patterning a photoresist layer by laser interference lithography, uniform gratings with a depth of 120 nm and a period of 507 nm were etched into the SiO$_2$ top cladding. The grating length varied between 1.25 mm and 4.75 mm. The grating-induced loss was 0.08 ± 0.01 dB/cm, while the maximum grating reflectivity exceeded 99%. These values enabled the realization of monolithic distributed Bragg reflector cavities with finesse up to 147 and quality factors of more than 1E6. The measured performance agrees very well with predictions based on coupled mode theory.

Original language	Undefined
Pages (from-to)	225-234
Number of pages	35
Journal	Photonics and nanostructures
Volume	9
Issue number	3
DOIs	https://doi.org/10.1016/j.photonics.2011.03.001
Publication status	Published - 16 Mar 2011

Keywords

METIS-277580
EWI-19799
IR-76404

Cite this

Bernhardi, E., Lu, Q., van Wolferen, H. A. G. M., Worhoff, K., de Ridder, R. M., & Pollnau, M. (2011). Monolithic Distributed Bragg Reﬂector Cavities in Al₂O₃ with Quality Factors Exceeding 10⁶. Photonics and nanostructures, 9(3), 225-234. https://doi.org/10.1016/j.photonics.2011.03.001

@article{e5def50ec8ea4a9e8b84d7cc52ccdcd4,

title = "Monolithic Distributed Bragg Reﬂector Cavities in Al2O3 with Quality Factors Exceeding 106",

abstract = ">The design, fabrication, and characterization of surface relief Bragg gratings integrated with aluminum oxide ridge waveguides are reported. After patterning a photoresist layer by laser interference lithography, uniform gratings with a depth of 120 nm and a period of 507 nm were etched into the SiO$_2$ top cladding. The grating length varied between 1.25 mm and 4.75 mm. The grating-induced loss was 0.08 ± 0.01 dB/cm, while the maximum grating reflectivity exceeded 99{\%}. These values enabled the realization of monolithic distributed Bragg reflector cavities with finesse up to 147 and quality factors of more than 1E6. The measured performance agrees very well with predictions based on coupled mode theory.",

keywords = "METIS-277580, EWI-19799, IR-76404",

author = "Edward Bernhardi and Q. Lu and {van Wolferen}, {Hendricus A.G.M.} and Kerstin Worhoff and {de Ridder}, R.M. and Markus Pollnau",

note = "10.1016/j.photonics.2011.03.001",

year = "2011",

month = "3",

day = "16",

doi = "10.1016/j.photonics.2011.03.001",

language = "Undefined",

volume = "9",

pages = "225--234",

journal = "Photonics and nanostructures",

issn = "1569-4410",

publisher = "Elsevier",

number = "3",

}

TY - JOUR

T1 - Monolithic Distributed Bragg Reﬂector Cavities in Al2O3 with Quality Factors Exceeding 106

AU - Bernhardi, Edward

AU - Lu, Q.

AU - van Wolferen, Hendricus A.G.M.

AU - Worhoff, Kerstin

AU - de Ridder, R.M.

AU - Pollnau, Markus

N1 - 10.1016/j.photonics.2011.03.001

PY - 2011/3/16

Y1 - 2011/3/16

N2 - >The design, fabrication, and characterization of surface relief Bragg gratings integrated with aluminum oxide ridge waveguides are reported. After patterning a photoresist layer by laser interference lithography, uniform gratings with a depth of 120 nm and a period of 507 nm were etched into the SiO$_2$ top cladding. The grating length varied between 1.25 mm and 4.75 mm. The grating-induced loss was 0.08 ± 0.01 dB/cm, while the maximum grating reflectivity exceeded 99%. These values enabled the realization of monolithic distributed Bragg reflector cavities with finesse up to 147 and quality factors of more than 1E6. The measured performance agrees very well with predictions based on coupled mode theory.

AB - >The design, fabrication, and characterization of surface relief Bragg gratings integrated with aluminum oxide ridge waveguides are reported. After patterning a photoresist layer by laser interference lithography, uniform gratings with a depth of 120 nm and a period of 507 nm were etched into the SiO$_2$ top cladding. The grating length varied between 1.25 mm and 4.75 mm. The grating-induced loss was 0.08 ± 0.01 dB/cm, while the maximum grating reflectivity exceeded 99%. These values enabled the realization of monolithic distributed Bragg reflector cavities with finesse up to 147 and quality factors of more than 1E6. The measured performance agrees very well with predictions based on coupled mode theory.

KW - METIS-277580

KW - EWI-19799

KW - IR-76404

U2 - 10.1016/j.photonics.2011.03.001

DO - 10.1016/j.photonics.2011.03.001

M3 - Article

VL - 9

SP - 225

EP - 234

JO - Photonics and nanostructures

JF - Photonics and nanostructures

SN - 1569-4410

IS - 3

ER -

Access to Document

10.1016/j.photonics.2011.03.001

http://eprints.eemcs.utwente.nl/secure2/19799/01/PNS_2011.pdf