MULTI-LAYER MIRROR FOR RADIATION IN THE XUV WAVELENGHT RANGE AND METHOD FOR MANUFACTURE THEREOF

Frederik Bijkerk, (Inventor), Eric Louis, (Inventor), M.J.H. Kessels (Inventor), Jan Verhoeven (Inventor), Harmen Markus Johannes Den Hartog (Inventor)

Research output: Patent

Abstract

Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.

Original languageEnglish
Patent numberWO02095771
IPCG21K 1/ 06 A I
Priority date23/05/01
Publication statusPublished - 28 Nov 2002

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