Multilayer based solutions for suppression of IR radiation in EUV systems

Viacheslav Medvedev, Toine van den Boogaard, Robbert Wilhelmus Elisabeth van de Kruijs, Andrey Yakshin, Eric Louis, V.M. Krivtsun, S.N. Yakunin, Frederik Bijkerk

Research output: Other contributionOther research output

Abstract

We have developed two multilayer based solutions that provide reflectivity of EUV radiation and suppression of IR radiation. The first solution is based on the B4C/Si periodical multilayer mirror deposited on a specially designed resonant absorbing structure. Substantial transparency of B4C and Si for IR radiation allowed us to integrate the periodical multilayer structure with a quarter-wavelength thin film absorber. The samples produced demonstrated suppression of the infrared radiation by about a factor of 300, with the EUV peak reflectance currently being achieved of about 45% at 13.5 nm. The FWHM of the B4C/Si multilayer mirror is about 0.284 nm that matches the 2% bandwidth of a typical EUV litho tool optical system. A second very viable solution is the application of a standard high reflectance EUV Mo/Si multilayer with a reflective grating. First experimental results on the optical response of lamellar quarter lambda reflectors have been obtained, where the filtering principle is based on suppression of the 0th diffracting order for 10.6 mm, with the energy being diffracted into higher orders, thus eliminating the specular reflection. At these not yet optimized optical elements, an EUV peak reflectance of 53% is currently obtained.
Original languageEnglish
Place of PublicationVeldhoven
Publication statusPublished - 2011

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retarding
reflectance
radiation
mirrors
specular reflection
infrared radiation
laminates
reflectors
absorbers
gratings
bandwidth
thin films
wavelengths
energy

Keywords

  • METIS-304961

Cite this

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title = "Multilayer based solutions for suppression of IR radiation in EUV systems",
abstract = "We have developed two multilayer based solutions that provide reflectivity of EUV radiation and suppression of IR radiation. The first solution is based on the B4C/Si periodical multilayer mirror deposited on a specially designed resonant absorbing structure. Substantial transparency of B4C and Si for IR radiation allowed us to integrate the periodical multilayer structure with a quarter-wavelength thin film absorber. The samples produced demonstrated suppression of the infrared radiation by about a factor of 300, with the EUV peak reflectance currently being achieved of about 45{\%} at 13.5 nm. The FWHM of the B4C/Si multilayer mirror is about 0.284 nm that matches the 2{\%} bandwidth of a typical EUV litho tool optical system. A second very viable solution is the application of a standard high reflectance EUV Mo/Si multilayer with a reflective grating. First experimental results on the optical response of lamellar quarter lambda reflectors have been obtained, where the filtering principle is based on suppression of the 0th diffracting order for 10.6 mm, with the energy being diffracted into higher orders, thus eliminating the specular reflection. At these not yet optimized optical elements, an EUV peak reflectance of 53{\%} is currently obtained.",
keywords = "METIS-304961",
author = "Viacheslav Medvedev and {van den Boogaard}, Toine and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and Andrey Yakshin and Eric Louis and V.M. Krivtsun and S.N. Yakunin and Frederik Bijkerk",
year = "2011",
language = "English",
type = "Other",

}

Multilayer based solutions for suppression of IR radiation in EUV systems. / Medvedev, Viacheslav; van den Boogaard, Toine; van de Kruijs, Robbert Wilhelmus Elisabeth; Yakshin, Andrey; Louis, Eric; Krivtsun, V.M.; Yakunin, S.N.; Bijkerk, Frederik.

Veldhoven. 2011, .

Research output: Other contributionOther research output

TY - GEN

T1 - Multilayer based solutions for suppression of IR radiation in EUV systems

AU - Medvedev, Viacheslav

AU - van den Boogaard, Toine

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Yakshin, Andrey

AU - Louis, Eric

AU - Krivtsun, V.M.

AU - Yakunin, S.N.

AU - Bijkerk, Frederik

PY - 2011

Y1 - 2011

N2 - We have developed two multilayer based solutions that provide reflectivity of EUV radiation and suppression of IR radiation. The first solution is based on the B4C/Si periodical multilayer mirror deposited on a specially designed resonant absorbing structure. Substantial transparency of B4C and Si for IR radiation allowed us to integrate the periodical multilayer structure with a quarter-wavelength thin film absorber. The samples produced demonstrated suppression of the infrared radiation by about a factor of 300, with the EUV peak reflectance currently being achieved of about 45% at 13.5 nm. The FWHM of the B4C/Si multilayer mirror is about 0.284 nm that matches the 2% bandwidth of a typical EUV litho tool optical system. A second very viable solution is the application of a standard high reflectance EUV Mo/Si multilayer with a reflective grating. First experimental results on the optical response of lamellar quarter lambda reflectors have been obtained, where the filtering principle is based on suppression of the 0th diffracting order for 10.6 mm, with the energy being diffracted into higher orders, thus eliminating the specular reflection. At these not yet optimized optical elements, an EUV peak reflectance of 53% is currently obtained.

AB - We have developed two multilayer based solutions that provide reflectivity of EUV radiation and suppression of IR radiation. The first solution is based on the B4C/Si periodical multilayer mirror deposited on a specially designed resonant absorbing structure. Substantial transparency of B4C and Si for IR radiation allowed us to integrate the periodical multilayer structure with a quarter-wavelength thin film absorber. The samples produced demonstrated suppression of the infrared radiation by about a factor of 300, with the EUV peak reflectance currently being achieved of about 45% at 13.5 nm. The FWHM of the B4C/Si multilayer mirror is about 0.284 nm that matches the 2% bandwidth of a typical EUV litho tool optical system. A second very viable solution is the application of a standard high reflectance EUV Mo/Si multilayer with a reflective grating. First experimental results on the optical response of lamellar quarter lambda reflectors have been obtained, where the filtering principle is based on suppression of the 0th diffracting order for 10.6 mm, with the energy being diffracted into higher orders, thus eliminating the specular reflection. At these not yet optimized optical elements, an EUV peak reflectance of 53% is currently obtained.

KW - METIS-304961

M3 - Other contribution

CY - Veldhoven

ER -