Multilayer coatings for the EUVL Process Development Tool

E. Louis*, E. Zoethout, R. W E Van De Kruijs, I. Nedelcu, A. E. Yakshin, S. Alonso Van Der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Müllender

*Corresponding author for this work

Research output: Contribution to journalConference articleAcademicpeer-review

11 Citations (Scopus)

Abstract

Reported is a summary of the coating of three elements of the illuminator and three of the projection optics of the EUVL Process Development Tool. The coating process used is e-beam evaporation in combination with low energy ion beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65% and the non correctable figure error that is added by the full multilayer stack is controlled to better than 15 picometer.

Original languageEnglish
Article number154
Pages (from-to)1170-1177
Number of pages8
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5751
Issue numberII
DOIs
Publication statusPublished - 19 Sep 2005
Externally publishedYes
EventEmerging Lithographic Technologies IX 2005 - San Jose, United States
Duration: 1 Mar 20053 Mar 2005
Conference number: 9

Keywords

  • EUV Lithography
  • Mo/Si multilayers

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