Multilayer development for Extreme Ultraviolet and shorter wavelength lithography

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Multilayer coatings form a key component of EUV optical systems. The research required to develop this class of optics is ongoing for several decades already. In this presentation we will discuss the path from fundamental research on the deposition of layers of a few nm thickness only towards a fully developed process, matured to deposit optics for prototype lithography machines. Topics like multilayer deposition, smoothing of interfaces, thermal stability, interface engineering, multilayer induced stress, and lateral uniformity will be discussed and examples of multilayer coated optics that fulfil the extremely tight specifications of EUV lithography machines will be given. Furthermore, solutions to suppress parasitic longer wavelength radiation emitted by EUV sources will be discussed. Yet, while the first EUV litho tools are being shipped to semiconductor manufacturers, research on multilayers for an even shorter wavelength of 6.x nm already takes place. This means other multilayer materials and, because of its increasing importance, even more focus on issues like smooth layer growth and prevention of intermixing.
Original languageEnglish
Place of PublicationDublin, Ireland
Publication statusPublished - 2011


  • METIS-304952


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