Abstract
6.7 nm — one of the possible candidate for next generation lithography optics needed LaN/B one of the most promising material combinations: à La and B show highest optical contrast for 6.7 nm wavelength à Nitridation of La increases optical contrast Narrow bandwidth of ML reflectance à ultimate reflectivity form the stack required
Original language | Undefined |
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Pages | - |
Publication status | Published - 20 Jun 2013 |
Event | 14th ASML Technology Conference 2013 - Hotel NH Eindhoven Conference Centre Koningshof, Eindhoven, Netherlands Duration: 20 Jun 2013 → 20 Jun 2013 Conference number: 14 |
Conference
Conference | 14th ASML Technology Conference 2013 |
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Country/Territory | Netherlands |
City | Eindhoven |
Period | 20/06/13 → 20/06/13 |
Keywords
- METIS-299685