Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

Viacheslav Medvedev; Robbert Wilhelmus Elisabeth van de Kruijs; Andrey Yakshin; N.N. Novikova; V.M. Krivtsun; A.M. Yakunin; Frederik Bijkerk

doi:10.1063/1.4837335

Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

Viacheslav Medvedev, Robbert Wilhelmus Elisabeth van de Kruijs, Andrey Yakshin, N.N. Novikova, V.M. Krivtsun, A.M. Yakunin, Frederik Bijkerk

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Abstract

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

Original language	English
Article number	221114
Pages (from-to)	221114-1-21114-4
Journal	Applied physics letters
Volume	103
Issue number	22
DOIs	https://doi.org/10.1063/1.4837335
Publication status	Published - 2013

Keywords

METIS-299280
IR-88108

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10.1063/1.4837335

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title = "Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography",

abstract = "We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.",

keywords = "METIS-299280, IR-88108",

author = "Viacheslav Medvedev and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and Andrey Yakshin and N.N. Novikova and V.M. Krivtsun and A.M. Yakunin and Frederik Bijkerk",

year = "2013",

doi = "10.1063/1.4837335",

language = "English",

volume = "103",

pages = "221114--1--21114--4",

journal = "Applied physics letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

AU - Medvedev, Viacheslav

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Yakshin, Andrey

AU - Novikova, N.N.

AU - Krivtsun, V.M.

AU - Yakunin, A.M.

AU - Bijkerk, Frederik

PY - 2013

Y1 - 2013

N2 - We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

AB - We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

KW - METIS-299280

KW - IR-88108

U2 - 10.1063/1.4837335

DO - 10.1063/1.4837335

M3 - Article

SN - 0003-6951

VL - 103

SP - 221114-1-21114-4

JO - Applied physics letters

JF - Applied physics letters

IS - 22

M1 - 221114

ER -

Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

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Keywords

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