Multilayer optics for 6.7 nm wavelength

Research output: Contribution to conferencePosterOther research output

Abstract

Optics for extreme ultraviolet radiation of 6.5-6.9 nm wavelength are of interest for many applications, such as photolithography, x-ray free electron lasers, x-ray spectroscopy or space research. Photolithography using a wavelength of ~6 nm is considered to be a potential extension of the currently introduced 13.5 nm, or EUV lithography. EUVL poses extremely high requirements on the quality of the multilayer optics. The performance of a single multilayer mirror (MLM) will affect the throughput of a multi-mirror optical system, proportionally to the power of the number of mirrors. The currently highest reflectivity of a single MLM of about 50 % is significantly lower than a desired reflectance of above 70 %. To reach this performance we first optimize the multilayer design by selecting the materials that shows the best optical contrast. The deposition process should be optimized to enable the lowest possible interface roughness to maximize layer contrast. The best material combination for 6.7 nm wavelength is based on lanthanum as a reflector and boron as a spacer material. In this presentation we will discuss the optimization of the optical design of La/B MLM, optimization of the deposition process and the analysis of the MLMs.
Original languageUndefined
Pages-
Publication statusPublished - 10 Dec 2012
EventNetherlands MicroNanoConference 2012 - Ede/Wageningen, Netherlands
Duration: 10 Dec 201211 Dec 2012

Conference

ConferenceNetherlands MicroNanoConference 2012
CountryNetherlands
CityEde/Wageningen
Period10/12/1211/12/12

Keywords

  • METIS-298883

Cite this

Makhotkin, I. A., Zoethout, E., Louis, E., & Bijkerk, F. (2012). Multilayer optics for 6.7 nm wavelength. -. Poster session presented at Netherlands MicroNanoConference 2012, Ede/Wageningen, Netherlands.
Makhotkin, Igor Alexandrovich ; Zoethout, E. ; Louis, Eric ; Bijkerk, Frederik. / Multilayer optics for 6.7 nm wavelength. Poster session presented at Netherlands MicroNanoConference 2012, Ede/Wageningen, Netherlands.
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title = "Multilayer optics for 6.7 nm wavelength",
abstract = "Optics for extreme ultraviolet radiation of 6.5-6.9 nm wavelength are of interest for many applications, such as photolithography, x-ray free electron lasers, x-ray spectroscopy or space research. Photolithography using a wavelength of ~6 nm is considered to be a potential extension of the currently introduced 13.5 nm, or EUV lithography. EUVL poses extremely high requirements on the quality of the multilayer optics. The performance of a single multilayer mirror (MLM) will affect the throughput of a multi-mirror optical system, proportionally to the power of the number of mirrors. The currently highest reflectivity of a single MLM of about 50 {\%} is significantly lower than a desired reflectance of above 70 {\%}. To reach this performance we first optimize the multilayer design by selecting the materials that shows the best optical contrast. The deposition process should be optimized to enable the lowest possible interface roughness to maximize layer contrast. The best material combination for 6.7 nm wavelength is based on lanthanum as a reflector and boron as a spacer material. In this presentation we will discuss the optimization of the optical design of La/B MLM, optimization of the deposition process and the analysis of the MLMs.",
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month = "12",
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note = "null ; Conference date: 10-12-2012 Through 11-12-2012",

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Makhotkin, IA, Zoethout, E, Louis, E & Bijkerk, F 2012, 'Multilayer optics for 6.7 nm wavelength' Netherlands MicroNanoConference 2012, Ede/Wageningen, Netherlands, 10/12/12 - 11/12/12, pp. -.

Multilayer optics for 6.7 nm wavelength. / Makhotkin, Igor Alexandrovich; Zoethout, E.; Louis, Eric; Bijkerk, Frederik.

2012. - Poster session presented at Netherlands MicroNanoConference 2012, Ede/Wageningen, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Multilayer optics for 6.7 nm wavelength

AU - Makhotkin, Igor Alexandrovich

AU - Zoethout, E.

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2012/12/10

Y1 - 2012/12/10

N2 - Optics for extreme ultraviolet radiation of 6.5-6.9 nm wavelength are of interest for many applications, such as photolithography, x-ray free electron lasers, x-ray spectroscopy or space research. Photolithography using a wavelength of ~6 nm is considered to be a potential extension of the currently introduced 13.5 nm, or EUV lithography. EUVL poses extremely high requirements on the quality of the multilayer optics. The performance of a single multilayer mirror (MLM) will affect the throughput of a multi-mirror optical system, proportionally to the power of the number of mirrors. The currently highest reflectivity of a single MLM of about 50 % is significantly lower than a desired reflectance of above 70 %. To reach this performance we first optimize the multilayer design by selecting the materials that shows the best optical contrast. The deposition process should be optimized to enable the lowest possible interface roughness to maximize layer contrast. The best material combination for 6.7 nm wavelength is based on lanthanum as a reflector and boron as a spacer material. In this presentation we will discuss the optimization of the optical design of La/B MLM, optimization of the deposition process and the analysis of the MLMs.

AB - Optics for extreme ultraviolet radiation of 6.5-6.9 nm wavelength are of interest for many applications, such as photolithography, x-ray free electron lasers, x-ray spectroscopy or space research. Photolithography using a wavelength of ~6 nm is considered to be a potential extension of the currently introduced 13.5 nm, or EUV lithography. EUVL poses extremely high requirements on the quality of the multilayer optics. The performance of a single multilayer mirror (MLM) will affect the throughput of a multi-mirror optical system, proportionally to the power of the number of mirrors. The currently highest reflectivity of a single MLM of about 50 % is significantly lower than a desired reflectance of above 70 %. To reach this performance we first optimize the multilayer design by selecting the materials that shows the best optical contrast. The deposition process should be optimized to enable the lowest possible interface roughness to maximize layer contrast. The best material combination for 6.7 nm wavelength is based on lanthanum as a reflector and boron as a spacer material. In this presentation we will discuss the optimization of the optical design of La/B MLM, optimization of the deposition process and the analysis of the MLMs.

KW - METIS-298883

M3 - Poster

SP - -

ER -

Makhotkin IA, Zoethout E, Louis E, Bijkerk F. Multilayer optics for 6.7 nm wavelength. 2012. Poster session presented at Netherlands MicroNanoConference 2012, Ede/Wageningen, Netherlands.