Multilayer optics with spectral purity layers for the EUV wavelength range

E. Louis*, R.W.E. van de Kruijs, A.E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M.M.J.W. van Herpen, D.J.W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, V. Banine

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)


Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies X
Publication statusPublished - 10 Jul 2006
Externally publishedYes
EventEmerging Lithographic Technologies X 2006 - San Jose, United States
Duration: 21 Jan 200623 Jan 2006
Conference number: 10

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6151 II
ISSN (Print)0277-786X


ConferenceEmerging Lithographic Technologies X 2006
Country/TerritoryUnited States
CitySan Jose


  • EUV Lithography
  • Mo/Si multilayers
  • Out of band radiation


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