Multilayer optics with spectral purity layers for the EUV wavelength range

E. Louis; R.W.E. van de Kruijs; A.E. Yakshin; S. Alonso van der Westen; F. Bijkerk; M.M.J.W. van Herpen; D.J.W. Klunder; L. Bakker; H. Enkisch; S. Müllender; M. Richter; V. Banine

doi:10.1117/12.675132

Multilayer optics with spectral purity layers for the EUV wavelength range

E. Louis^*, R.W.E. van de Kruijs, A.E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M.M.J.W. van Herpen, D.J.W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, V. Banine

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

Abstract

Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.

Original language	English
Title of host publication	Emerging Lithographic Technologies X
DOIs	https://doi.org/10.1117/12.675132
Publication status	Published - 10 Jul 2006
Externally published	Yes
Event	Emerging Lithographic Technologies X 2006 - San Jose, United States Duration: 21 Jan 2006 → 23 Jan 2006 Conference number: 10

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6151 II
ISSN (Print)	0277-786X

Conference

Conference	Emerging Lithographic Technologies X 2006
Country/Territory	United States
City	San Jose
Period	21/01/06 → 23/01/06

Keywords

EUV Lithography
Mo/Si multilayers
Out of band radiation

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10.1117/12.675132

Cite this

Louis, E., van de Kruijs, R. W. E., Yakshin, A. E., Alonso van der Westen, S., Bijkerk, F., van Herpen, M. M. J. W., Klunder, D. J. W., Bakker, L., Enkisch, H., Müllender, S., Richter, M., & Banine, V. (2006). Multilayer optics with spectral purity layers for the EUV wavelength range. In Emerging Lithographic Technologies X Article 615139 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6151 II). https://doi.org/10.1117/12.675132

@inproceedings{cf136733e6034ee49efd603b70b517ef,

title = "Multilayer optics with spectral purity layers for the EUV wavelength range",

abstract = "Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.",

keywords = "EUV Lithography, Mo/Si multilayers, Out of band radiation",

author = "E. Louis and {van de Kruijs}, R.W.E. and A.E. Yakshin and {Alonso van der Westen}, S. and F. Bijkerk and {van Herpen}, M.M.J.W. and D.J.W. Klunder and L. Bakker and H. Enkisch and S. M{\"u}llender and M. Richter and V. Banine",

year = "2006",

month = jul,

day = "10",

doi = "10.1117/12.675132",

language = "English",

isbn = "0819461946",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Emerging Lithographic Technologies X",

note = "Emerging Lithographic Technologies X 2006 ; Conference date: 21-01-2006 Through 23-01-2006",

}

Louis, E , van de Kruijs, RWE , Yakshin, AE, Alonso van der Westen, S, Bijkerk, F, van Herpen, MMJW, Klunder, DJW, Bakker, L, Enkisch, H, Müllender, S, Richter, M & Banine, V 2006, Multilayer optics with spectral purity layers for the EUV wavelength range. in Emerging Lithographic Technologies X., 615139, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6151 II, Emerging Lithographic Technologies X 2006, San Jose, California, United States, 21/01/06. https://doi.org/10.1117/12.675132

Multilayer optics with spectral purity layers for the EUV wavelength range. / Louis, E.; van de Kruijs, R.W.E.; Yakshin, A.E. et al.
Emerging Lithographic Technologies X. 2006. 615139 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6151 II).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Multilayer optics with spectral purity layers for the EUV wavelength range

AU - Louis, E.

AU - van de Kruijs, R.W.E.

AU - Yakshin, A.E.

AU - Alonso van der Westen, S.

AU - Bijkerk, F.

AU - van Herpen, M.M.J.W.

AU - Klunder, D.J.W.

AU - Bakker, L.

AU - Enkisch, H.

AU - Müllender, S.

AU - Richter, M.

AU - Banine, V.

N1 - Conference code: 10

PY - 2006/7/10

Y1 - 2006/7/10

N2 - Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.

AB - Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.

KW - EUV Lithography

KW - Mo/Si multilayers

KW - Out of band radiation

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DO - 10.1117/12.675132

M3 - Conference contribution

AN - SCOPUS:33745632028

SN - 0819461946

SN - 9780819461940

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Emerging Lithographic Technologies X

T2 - Emerging Lithographic Technologies X 2006

Y2 - 21 January 2006 through 23 January 2006

ER -

Multilayer optics with spectral purity layers for the EUV wavelength range

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