Multilayers for 6.8 nm Wavelength

Igor Alexandrovich Makhotkin, E. Zoethout, Eric Louis, A.M. Yakunin, V. Banine, S. Muellender, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output

3 Downloads (Pure)

Abstract

Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the current 13.5 nm EUV lithography. Light sources might be based on Tb or Gd. The published spectra of plasmas created from these materials show highest intensities at 6.5 and 6.8 nm respectively. Multilayer mirrors (MLMs) based on La and B show the highest optical contrast for the 6.6-7 nm wavelength range and a maximum reflectance at 6.64 nm, where the B absorption is minimal. It is not possible to design high reflective B-based mirrors for 6.5 nm because this would be below the B-K absorption edge. In theory the reflectivity of La/B MLMs at 6.8 nm is only a few percent lower than at the optimal wavelength of 6.64 nm, but measurements of real multilayer mirrors show a significantly larger reduction of reflectivity at 6.8 nm. The origin of this larger drop is the reduced optical contrast of the deposited La/B mirror with respect to theoretical case. In the presentation we will discuss how the multilayer structure influences its reflectivity profile and the ways to optimize La/B mirrors for 6.8 nm.
Original languageEnglish
Pages74-74
Publication statusPublished - 8 Oct 2012
Event2012 International Workshop on EUV and Soft X-ray Sources - Dublin, Ireland
Duration: 8 Oct 201211 Oct 2012
https://euvlitho.com/source-workshop/2012-source-workshop/

Conference

Conference2012 International Workshop on EUV and Soft X-ray Sources
CountryIreland
CityDublin
Period8/10/1211/10/12
Internet address

Fingerprint

mirrors
wavelengths
reflectance
lithography
laminates
light sources
profiles

Keywords

  • METIS-298885

Cite this

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Banine, V., Muellender, S., & Bijkerk, F. (2012). Multilayers for 6.8 nm Wavelength. 74-74. Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.
Makhotkin, Igor Alexandrovich ; Zoethout, E. ; Louis, Eric ; Yakunin, A.M. ; Banine, V. ; Muellender, S. ; Bijkerk, Frederik. / Multilayers for 6.8 nm Wavelength. Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.
@conference{dd06ba3127ce4df183576760974d977a,
title = "Multilayers for 6.8 nm Wavelength",
abstract = "Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the current 13.5 nm EUV lithography. Light sources might be based on Tb or Gd. The published spectra of plasmas created from these materials show highest intensities at 6.5 and 6.8 nm respectively. Multilayer mirrors (MLMs) based on La and B show the highest optical contrast for the 6.6-7 nm wavelength range and a maximum reflectance at 6.64 nm, where the B absorption is minimal. It is not possible to design high reflective B-based mirrors for 6.5 nm because this would be below the B-K absorption edge. In theory the reflectivity of La/B MLMs at 6.8 nm is only a few percent lower than at the optimal wavelength of 6.64 nm, but measurements of real multilayer mirrors show a significantly larger reduction of reflectivity at 6.8 nm. The origin of this larger drop is the reduced optical contrast of the deposited La/B mirror with respect to theoretical case. In the presentation we will discuss how the multilayer structure influences its reflectivity profile and the ways to optimize La/B mirrors for 6.8 nm.",
keywords = "METIS-298885",
author = "Makhotkin, {Igor Alexandrovich} and E. Zoethout and Eric Louis and A.M. Yakunin and V. Banine and S. Muellender and Frederik Bijkerk",
year = "2012",
month = "10",
day = "8",
language = "English",
pages = "74--74",
note = "2012 International Workshop on EUV and Soft X-ray Sources ; Conference date: 08-10-2012 Through 11-10-2012",
url = "https://euvlitho.com/source-workshop/2012-source-workshop/",

}

Makhotkin, IA, Zoethout, E, Louis, E, Yakunin, AM, Banine, V, Muellender, S & Bijkerk, F 2012, 'Multilayers for 6.8 nm Wavelength' 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland, 8/10/12 - 11/10/12, pp. 74-74.

Multilayers for 6.8 nm Wavelength. / Makhotkin, Igor Alexandrovich; Zoethout, E.; Louis, Eric; Yakunin, A.M.; Banine, V.; Muellender, S.; Bijkerk, Frederik.

2012. 74-74 Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Multilayers for 6.8 nm Wavelength

AU - Makhotkin, Igor Alexandrovich

AU - Zoethout, E.

AU - Louis, Eric

AU - Yakunin, A.M.

AU - Banine, V.

AU - Muellender, S.

AU - Bijkerk, Frederik

PY - 2012/10/8

Y1 - 2012/10/8

N2 - Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the current 13.5 nm EUV lithography. Light sources might be based on Tb or Gd. The published spectra of plasmas created from these materials show highest intensities at 6.5 and 6.8 nm respectively. Multilayer mirrors (MLMs) based on La and B show the highest optical contrast for the 6.6-7 nm wavelength range and a maximum reflectance at 6.64 nm, where the B absorption is minimal. It is not possible to design high reflective B-based mirrors for 6.5 nm because this would be below the B-K absorption edge. In theory the reflectivity of La/B MLMs at 6.8 nm is only a few percent lower than at the optimal wavelength of 6.64 nm, but measurements of real multilayer mirrors show a significantly larger reduction of reflectivity at 6.8 nm. The origin of this larger drop is the reduced optical contrast of the deposited La/B mirror with respect to theoretical case. In the presentation we will discuss how the multilayer structure influences its reflectivity profile and the ways to optimize La/B mirrors for 6.8 nm.

AB - Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the current 13.5 nm EUV lithography. Light sources might be based on Tb or Gd. The published spectra of plasmas created from these materials show highest intensities at 6.5 and 6.8 nm respectively. Multilayer mirrors (MLMs) based on La and B show the highest optical contrast for the 6.6-7 nm wavelength range and a maximum reflectance at 6.64 nm, where the B absorption is minimal. It is not possible to design high reflective B-based mirrors for 6.5 nm because this would be below the B-K absorption edge. In theory the reflectivity of La/B MLMs at 6.8 nm is only a few percent lower than at the optimal wavelength of 6.64 nm, but measurements of real multilayer mirrors show a significantly larger reduction of reflectivity at 6.8 nm. The origin of this larger drop is the reduced optical contrast of the deposited La/B mirror with respect to theoretical case. In the presentation we will discuss how the multilayer structure influences its reflectivity profile and the ways to optimize La/B mirrors for 6.8 nm.

KW - METIS-298885

M3 - Poster

SP - 74

EP - 74

ER -

Makhotkin IA, Zoethout E, Louis E, Yakunin AM, Banine V, Muellender S et al. Multilayers for 6.8 nm Wavelength. 2012. Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.