Multilayers for the lithography generation beyond EUVL

Research output: Contribution to conferencePoster

Original languageEnglish
Pages-
Publication statusPublished - 29 Sep 2012
Event2012 International Symposium on Extreme Ultraviolet Lithography - Brussels, Belgium
Duration: 30 Sep 20124 Oct 2012

Conference

Conference2012 International Symposium on Extreme Ultraviolet Lithography
CountryBelgium
CityBrussels
Period30/09/124/10/12

Keywords

  • METIS-283392

Cite this

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, N., & Bijkerk, F. (2012). Multilayers for the lithography generation beyond EUVL. -. Poster session presented at 2012 International Symposium on Extreme Ultraviolet Lithography, Brussels, Belgium.