Nano-flow thermal sensor applying dymamic w-2w sensing method

Marcel Dijkstra, Theodorus S.J. Lammerink, Remco J. Wiegerink, Michael Curt Elwenspoek

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    Abstract

    This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.
    Original languageUndefined
    Title of host publicationProceedings of the 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006
    Place of PublicationSouthampton
    PublisherSouthampton University Press
    Pages1-4
    Number of pages4
    ISBN (Print)085432 848 3
    Publication statusPublished - 3 Sep 2006
    Event17th Micromechanics Europe Workshop, MME 2006 - Southampton, United Kingdom
    Duration: 3 Sep 20065 Sep 2006
    Conference number: 17

    Publication series

    Name
    PublisherSouthampton University Press
    NumberIEEE Produ

    Conference

    Conference17th Micromechanics Europe Workshop, MME 2006
    Abbreviated titleMME
    CountryUnited Kingdom
    CitySouthampton
    Period3/09/065/09/06

    Keywords

    • EWI-9178
    • IR-66904
    • METIS-238772
    • Lab-on-Chip
    • Thermal flow sensor
    • Micro-fluidics

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