Nano-flow thermal sensor applying dymamic w-2w sensing method

Marcel Dijkstra; Theodorus S.J. Lammerink; Remco J. Wiegerink; Michael Curt Elwenspoek

Nano-flow thermal sensor applying dymamic w-2w sensing method

Marcel Dijkstra, Theodorus S.J. Lammerink, Remco J. Wiegerink, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.

Original language	Undefined
Title of host publication	Proceedings of the 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006
Place of Publication	Southampton
Publisher	Southampton University Press
Pages	1-4
Number of pages	4
ISBN (Print)	085432 848 3
Publication status	Published - 3 Sep 2006
Event	17th Micromechanics Europe Workshop, MME 2006 - Southampton, United Kingdom Duration: 3 Sep 2006 → 5 Sep 2006 Conference number: 17

Publication series

Name
Publisher	Southampton University Press
Number	IEEE Produ

Conference

Conference	17th Micromechanics Europe Workshop, MME 2006
Abbreviated title	MME
Country/Territory	United Kingdom
City	Southampton
Period	3/09/06 → 5/09/06

Keywords

EWI-9178
IR-66904
METIS-238772
Lab-on-Chip
Thermal flow sensor
Micro-fluidics

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Cite this

@inproceedings{a6e775ad31814f39802714cc25c89482,

title = "Nano-flow thermal sensor applying dymamic w-2w sensing method",

abstract = "This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.",

keywords = "EWI-9178, IR-66904, METIS-238772, Lab-on-Chip, Thermal flow sensor, Micro-fluidics",

author = "Marcel Dijkstra and Lammerink, {Theodorus S.J.} and Wiegerink, {Remco J.} and Elwenspoek, {Michael Curt}",

year = "2006",

month = sep,

day = "3",

language = "Undefined",

isbn = "085432 848 3",

publisher = "Southampton University Press",

number = "IEEE Produ",

pages = "1--4",

booktitle = "Proceedings of the 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006",

note = "null ; Conference date: 03-09-2006 Through 05-09-2006",

}

Nano-flow thermal sensor applying dymamic w-2w sensing method. / Dijkstra, Marcel; Lammerink, Theodorus S.J.; Wiegerink, Remco J. et al.

Proceedings of the 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006. Southampton : Southampton University Press, 2006. p. 1-4.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Nano-flow thermal sensor applying dymamic w-2w sensing method

AU - Dijkstra, Marcel

AU - Lammerink, Theodorus S.J.

AU - Wiegerink, Remco J.

AU - Elwenspoek, Michael Curt

N1 - Conference code: 17

PY - 2006/9/3

Y1 - 2006/9/3

N2 - This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.

AB - This article presents microchannel thermal flow sensors fabricated using standard micromachining technology. The sensors comprise of a SiXNY microchannel created by etching of a poly-Si sacrificial layer. The channels are released by KOH etching through inlets and outlets etched from the backside of the substrate. Liquid flow is measured by platinum resistors deposited on top of the microchannel, while the channel is thermally isolated from the substrate by a SiXNY membrane. Flow rates of DI water in the order of nl⋅min-1 have been measured using a dynamic sensing method applying heat waves.

KW - EWI-9178

KW - IR-66904

KW - METIS-238772

KW - Lab-on-Chip

KW - Thermal flow sensor

KW - Micro-fluidics

M3 - Conference contribution

SN - 085432 848 3

SP - 1

EP - 4

BT - Proceedings of the 17th Workshop on Micromachining, Micromechanics and Microsystems, MME 2006

PB - Southampton University Press

CY - Southampton

Y2 - 3 September 2006 through 5 September 2006

ER -