Nano-pyramid arrays for nano-particle trapping

Xingwu Sun; Henk-Willem Veltkamp; Johan W. Berenschot; Johannes G.E. Gardeniers; Niels Roelof Tas

doi:10.1109/MEMSYS.2016.7421589

Nano-pyramid arrays for nano-particle trapping

Xingwu Sun, Henk-Willem Veltkamp, Johan W. Berenschot, Johannes G.E. Gardeniers, Niels Roelof Tas

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

Abstract In this paper we present the drastic miniaturization of nano-wire pyramids fabricated by corner lithography. A particle trapping device was fabricated in a well-defined and symmetrical array. The entrance and exit hole-size can be tuned by adjusting fabrication parameters. We describe here in detail the effect of the corner lithography over-etch factor on side-aperture size and shape. To show the trapping functionality, 150 nm gold nano-particles trapping was demonstrated and the device with trapped particles was imaged by Scanning Electron Microscopy (SEM). © 2016 IEEE.

Original language	English
Title of host publication	Nano-pyramid arrays for nano-particle trapping
Place of Publication	Category numberCFP16MEM-ART; Code 119597
Pages	185-188
DOIs	https://doi.org/10.1109/MEMSYS.2016.7421589
Publication status	Published - 24 Jan 2016
Event	29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016 - Shanghai, China Duration: 24 Jan 2016 → 28 Jan 2016 Conference number: 29

Publication series

Name
Volume	7421589
ISSN (Print)	1084-6999

Conference

Conference	29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016
Abbreviated title	MEMS
Country/Territory	China
City	Shanghai
Period	24/01/16 → 28/01/16

Keywords

METIS-320592
IR-103877

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10.1109/MEMSYS.2016.7421589

Cite this

@inproceedings{b59c6b272a554bf8a0c446f171ed73e0,

title = "Nano-pyramid arrays for nano-particle trapping",

abstract = "Abstract In this paper we present the drastic miniaturization of nano-wire pyramids fabricated by corner lithography. A particle trapping device was fabricated in a well-defined and symmetrical array. The entrance and exit hole-size can be tuned by adjusting fabrication parameters. We describe here in detail the effect of the corner lithography over-etch factor on side-aperture size and shape. To show the trapping functionality, 150 nm gold nano-particles trapping was demonstrated and the device with trapped particles was imaged by Scanning Electron Microscopy (SEM). {\textcopyright} 2016 IEEE.",

keywords = "METIS-320592, IR-103877",

author = "Xingwu Sun and Henk-Willem Veltkamp and Berenschot, {Johan W.} and Gardeniers, {Johannes G.E.} and Tas, {Niels Roelof}",

year = "2016",

month = jan,

day = "24",

doi = "10.1109/MEMSYS.2016.7421589",

language = "English",

isbn = "978-150901973-1",

pages = "185--188",

booktitle = "Nano-pyramid arrays for nano-particle trapping",

note = "29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016, MEMS ; Conference date: 24-01-2016 Through 28-01-2016",

}

Sun, X, Veltkamp, H-W , Berenschot, JW , Gardeniers, JGE & Tas, NR 2016, Nano-pyramid arrays for nano-particle trapping. in Nano-pyramid arrays for nano-particle trapping. Category numberCFP16MEM-ART; Code 119597, pp. 185-188, 29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016, Shanghai, China, 24/01/16. https://doi.org/10.1109/MEMSYS.2016.7421589

TY - GEN

T1 - Nano-pyramid arrays for nano-particle trapping

AU - Sun, Xingwu

AU - Veltkamp, Henk-Willem

AU - Berenschot, Johan W.

AU - Gardeniers, Johannes G.E.

AU - Tas, Niels Roelof

N1 - Conference code: 29

PY - 2016/1/24

Y1 - 2016/1/24

N2 - Abstract In this paper we present the drastic miniaturization of nano-wire pyramids fabricated by corner lithography. A particle trapping device was fabricated in a well-defined and symmetrical array. The entrance and exit hole-size can be tuned by adjusting fabrication parameters. We describe here in detail the effect of the corner lithography over-etch factor on side-aperture size and shape. To show the trapping functionality, 150 nm gold nano-particles trapping was demonstrated and the device with trapped particles was imaged by Scanning Electron Microscopy (SEM). © 2016 IEEE.

AB - Abstract In this paper we present the drastic miniaturization of nano-wire pyramids fabricated by corner lithography. A particle trapping device was fabricated in a well-defined and symmetrical array. The entrance and exit hole-size can be tuned by adjusting fabrication parameters. We describe here in detail the effect of the corner lithography over-etch factor on side-aperture size and shape. To show the trapping functionality, 150 nm gold nano-particles trapping was demonstrated and the device with trapped particles was imaged by Scanning Electron Microscopy (SEM). © 2016 IEEE.

KW - METIS-320592

KW - IR-103877

U2 - 10.1109/MEMSYS.2016.7421589

DO - 10.1109/MEMSYS.2016.7421589

M3 - Conference contribution

SN - 978-150901973-1

SP - 185

EP - 188

BT - Nano-pyramid arrays for nano-particle trapping

CY - Category numberCFP16MEM-ART; Code 119597

T2 - 29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016

Y2 - 24 January 2016 through 28 January 2016

ER -

Nano-pyramid arrays for nano-particle trapping

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