TY - JOUR
T1 - Nano-Structuring by Molecular Self-Assembly
AU - Minelli, Caterina
AU - Blondiaux, Nicolas
AU - Losson, Myriam
AU - Liley, Martha
AU - Jeney, Sylvia
AU - Hinderling, Christian
AU - Pugin, Raphaël
AU - Joester, Derk
AU - Diederich, François
AU - Vancso, Julius
AU - Hempenius, Mark
AU - Heinzelmann, Harry
PY - 2003
Y1 - 2003
N2 - In contrast to conventional lithography techniques which will soon hit their limits in terms of feature size and fabrication cost, recent years have seen considerable progress in the development of self-assembling nano-structured surfaces. In the work reported here, surface structures on the submicron scale have been created from polymer, copolymer, nanoparticle, and dendrimer building blocks by employing phenomena such as self-assembly, self-organization and non-equilibrium processes. This low-cost approach is expected to result in a new generation of surfaces with novel physical and chemical properties.
AB - In contrast to conventional lithography techniques which will soon hit their limits in terms of feature size and fabrication cost, recent years have seen considerable progress in the development of self-assembling nano-structured surfaces. In the work reported here, surface structures on the submicron scale have been created from polymer, copolymer, nanoparticle, and dendrimer building blocks by employing phenomena such as self-assembly, self-organization and non-equilibrium processes. This low-cost approach is expected to result in a new generation of surfaces with novel physical and chemical properties.
U2 - 10.2533/000942903777678786
DO - 10.2533/000942903777678786
M3 - Article
SN - 0009-4293
VL - 57
SP - 646
EP - 650
JO - Chimia
JF - Chimia
ER -