Nanochannels in SU-8 with floor and ceiling metal electrodes and integrated microchannels

Kevin P. Nichols; Jan C.T. Eijkel; Han J.G.E. Gardeniers

doi:10.1039/b715917j

Nanochannels in SU-8 with floor and ceiling metal electrodes and integrated microchannels

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Abstract

Sacrificially etched 2-D nanofluidic channels and nanospaces with integrated floor and ceiling electrodes and arbitrary channel geometries have been demonstrated with channel heights from 20 nm to 400 nm, widths from 800 nm to 40 mm, and lengths up to 3 mm, using SU-8 as the channel structural material

Original language	English
Pages (from-to)	173-175
Number of pages	3
Journal	Lab on a chip
Volume	8
Issue number	2008
DOIs	https://doi.org/10.1039/b715917j
Publication status	Published - 2008

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2024 OA procedure

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10.1039/b715917j

ArticleFinal published version, 266 KBLicence: Taverne

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title = "Nanochannels in SU-8 with floor and ceiling metal electrodes and integrated microchannels",

abstract = "Sacrificially etched 2-D nanofluidic channels and nanospaces with integrated floor and ceiling electrodes and arbitrary channel geometries have been demonstrated with channel heights from 20 nm to 400 nm, widths from 800 nm to 40 mm, and lengths up to 3 mm, using SU-8 as the channel structural material",

keywords = "2024 OA procedure",

author = "Nichols, \{Kevin P.\} and Eijkel, \{Jan C.T.\} and Gardeniers, \{Han J.G.E.\}",

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AU - Nichols, Kevin P.

AU - Eijkel, Jan C.T.

AU - Gardeniers, Han J.G.E.

PY - 2008

Y1 - 2008

N2 - Sacrificially etched 2-D nanofluidic channels and nanospaces with integrated floor and ceiling electrodes and arbitrary channel geometries have been demonstrated with channel heights from 20 nm to 400 nm, widths from 800 nm to 40 mm, and lengths up to 3 mm, using SU-8 as the channel structural material

AB - Sacrificially etched 2-D nanofluidic channels and nanospaces with integrated floor and ceiling electrodes and arbitrary channel geometries have been demonstrated with channel heights from 20 nm to 400 nm, widths from 800 nm to 40 mm, and lengths up to 3 mm, using SU-8 as the channel structural material

KW - 2024 OA procedure

U2 - 10.1039/b715917j

DO - 10.1039/b715917j

M3 - Article

SN - 1473-0197

VL - 8

SP - 173

EP - 175

JO - Lab on a chip

JF - Lab on a chip

IS - 2008

ER -

Nanochannels in SU-8 with floor and ceiling metal electrodes and integrated microchannels

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Keywords

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