Nanoimprint Lithography for Nanophotonics in Silicon

C.M. Bruinink, Matteo Burresi, M. Burresi, Meint J. de Boer, Franciscus B. Segerink, Henricus V. Jansen, Johan W. Berenschot, David Reinhoudt, Jurriaan Huskens, L. Kuipers

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A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
Original languageUndefined
Pages (from-to)2872-2877
Number of pages6
JournalNano letters
Issue number9
Publication statusPublished - 12 Aug 2008


  • METIS-251350
  • EWI-14645
  • IR-59457

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