Nanopatterning of functional materials by gas phase pattern deposition of self assembled molecular thin films in combination with electrodeposition

A. George, A.W. Maijenburg, Duc Minh Nguyen, M.G. Maas, David H.A. Blank, Johan E. ten Elshof

Research output: Contribution to journalArticleAcademicpeer-review

8 Citations (Scopus)

Abstract

We present a general methodology to pattern functional materials on the nanometer scale using self-assembled molecular templates on conducting substrates. A soft lithographic gas phase edge patterning process using poly(dimethylsiloxane) molds was employed to form electrically isolating organosilane patterns of a few nanometer thickness and a line width that could be tuned by varying the time of deposition. Electrodeposition was employed to deposit patterns of Ni and ZnO on these prepatterned substrates. Deposition occurred only on patches of the substrate where no organosilane monolayer was present. The process is simple, inexpensive, and scalable to large areas. We achieved formation of metallic and oxide material patterns with a lateral resolution of 80 nm
Original languageEnglish
Pages (from-to)12760-12768
Number of pages9
JournalLangmuir
Volume27
Issue number20
DOIs
Publication statusPublished - 2011

Keywords

  • METIS-280144
  • IR-79731

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