Nanopores Created using an Internal Shadowmask Process

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Abstract

AbstractWe report on the manufacturing of nanopore through-holes by heating gold nanoparticles on a silicon oxide (SiO2) sheet, suspended in a silicon-rich nitride membrane (SiRN).Membrane patterning is performed using self-alignment by an internal shadow mask based process. A benefit of this approach is the ease at which downscaling of the lithographic features can be achieved. With a single alignment, a shadow mask is etched and metal is deposited. The nanopore through hole is then created after heating. In this paper this scalable technique is applied to create non-buckled membranes by combining the compressive and tensile stress components in a SiO2/SiRN bilayer. Theory on the bilayer stresses is given in order to characterize the buckling. The nanopore through holes are characterized using ionic currentmeasurements and electron microscopy techniques.
Original languageEnglish
Title of host publicationIEEE 11th Annual International Conference on Nano/Micro Engineered and Molecular Systems (NEMS 2016)
PublisherIEEE
ISBN (Electronic)978-1-5090-1947-2
ISBN (Print)978-1-5090-1948-9
DOIs
Publication statusPublished - 17 Apr 2016
Event11th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2016 - Hotel Matsushima Taikanso, Matsushima Bay and Sendai MEMS City, Japan
Duration: 17 Apr 201620 Apr 2016
Conference number: 11
https://ieee-nems.org/2016/

Conference

Conference11th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2016
Abbreviated titleNEMS
CountryJapan
CityMatsushima Bay and Sendai MEMS City
Period17/04/1620/04/16
Internet address

Keywords

  • METIS-320317

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