TY - JOUR
T1 - Nanoscaffold's stiffness affects primary cortical cell network formation
AU - Xie, Sijia
AU - Schurink, Bart
AU - Wolbers, Floor
AU - Lüttge, Regina
AU - Hassink, Gerrit Cornelis
PY - 2014/11
Y1 - 2014/11
N2 - Networks of neurons cultured on-chip can provide insights into both normal and disease-state brain function. The ability to guide neuronal growth in specific, artificially designed patterns allows us to study how brain function follows form. Primary cortical cells cultured on nanograting scaffolds, in particular astrocytes, showed highly ordered regions of dendritic outgrowth. Usually, materials suitable for nanopatterning have a stiffness far above that of the extracellular matrix. In this paper, the authors studied two materials with large differences in stiffness, polydimethylsiloxane (PDMS) and silicon. Our results show that both nanopatterned silicon and PDMS guide the outgrowth of astrocytes in cortical cell culture, but the growth of the astrocyte is affected by the stiffness of the substrate, as revealed by differences in the cell soma size and the organization of the outgrowth.
AB - Networks of neurons cultured on-chip can provide insights into both normal and disease-state brain function. The ability to guide neuronal growth in specific, artificially designed patterns allows us to study how brain function follows form. Primary cortical cells cultured on nanograting scaffolds, in particular astrocytes, showed highly ordered regions of dendritic outgrowth. Usually, materials suitable for nanopatterning have a stiffness far above that of the extracellular matrix. In this paper, the authors studied two materials with large differences in stiffness, polydimethylsiloxane (PDMS) and silicon. Our results show that both nanopatterned silicon and PDMS guide the outgrowth of astrocytes in cortical cell culture, but the growth of the astrocyte is affected by the stiffness of the substrate, as revealed by differences in the cell soma size and the organization of the outgrowth.
U2 - 10.1116/1.4900420
DO - 10.1116/1.4900420
M3 - Article
SN - 2166-2746
VL - 32
JO - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
JF - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
M1 - 06FD03
ER -