Nanoscale patterning by UV nanoimprint lithography using an organometallic resist

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined
Pages (from-to)	2645-2650
Number of pages	6
Journal	ACS applied materials & interfaces
Volume	1
Publication status	Published - 2009

Keywords

@article{75370dfa26c34a1b9ab3c732199bdecb,

title = "Nanoscale patterning by UV nanoimprint lithography using an organometallic resist",

keywords = "METIS-262729",

author = "C. Acikgoz and B. Vratzov and Hempenius, {Mark A.} and David Reinhoudt and Vancso, {Gyula J.} and Jurriaan Huskens",

year = "2009",

language = "Undefined",

volume = "1",

pages = "2645--2650",

journal = "ACS applied materials & interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

}

TY - JOUR

T1 - Nanoscale patterning by UV nanoimprint lithography using an organometallic resist

AU - Acikgoz, C.

AU - Vratzov, B.

AU - Hempenius, Mark A.

AU - Reinhoudt, David

AU - Vancso, Gyula J.

AU - Huskens, Jurriaan

PY - 2009

Y1 - 2009

KW - METIS-262729

M3 - Article

SN - 1944-8244

VL - 1

SP - 2645

EP - 2650

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

ER -