Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition

A. George, M. Knez, G. Hlawacek, D. Hagedoorn, H.H.J. Verputten, Raoul van Gastel, Johan E. ten Elshof

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21 Citations (Scopus)


A simple methodology to fabricate micrometer- and nanometer-scale patterned surfaces with multiple chemical functionalities is presented. Patterns with lateral dimensions down to 110 nm were made. The fabrication process involves multistep gas-phase patterning of amine, thiol, alkyl, and fluorinated alkyl-functional organosilane molecules using PDMS molds as shadow masks. Also, a combination process of channel diffused plasma etching of organosilane molecular thin films in combination with masked gas-phase deposition to fabricate multilength scale, multifunctional surfaces is demonstrated.
Original languageEnglish
Pages (from-to)3045-3052
Number of pages8
Issue number5
Publication statusPublished - 2012



  • Optics (see also 3311)Solid state physics (see also 2307)Andere transportmiddelenNiet in een andere rubriek onder te brengen
  • METIS-288499
  • IR-81878

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