Nanoscale Transition Metal Thin Films: Growth Characteristics and Scaling Law for Interlayer Formation

Anirudhan Chandrasekaran*, Robbert W.E. van de Kruijs, J.M. Sturm, Andrey Zameshin, F. Bijkerk

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

A comprehensive study on the growth of nanoscale transition metal-on-transition metal (TM-on-TM) systems is presented. The near room-temperature intermixing and segregation phenomena during growth are studied in vacuo using high-sensitivity low-energy ion scattering. The investigated TM-on-TM systems are classified into four types according to the observed intermixing and segregation behavior. Empirical rules are suggested to qualitatively predict the growth characteristics of any TM-on-TM system based on the atomic size difference, surface-energy difference, and enthalpy of mixing between the film and substrate atoms. An exponential trend is observed in the effective interface width as a function of the surface-energy difference between the film and substrate layers, with a subtrend based on the crystal structure of the TM layers. A semiempirical model that accurately describes the experimental data is presented. It serves as a scaling law to predict the effective interface width and the minimum film thickness required for full film coverage in TM-on-TM systems in general. The ability to predict the growth characteristics as well as the interface width for any TM-on-TM system significantly contributes to the process of finding the best material combination for a specific application, where layer growth characteristics are implicitly considered when selecting materials based on their functional properties.
Original languageEnglish
Pages (from-to)46311−46326
Number of pages16
JournalACS applied materials & interfaces
Volume11
Issue number49
Early online date15 Nov 2019
DOIs
Publication statusPublished - 11 Dec 2019

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Scaling laws
Film growth
Transition metals
Thin films
Interfacial energy
Substrates
Film thickness
Enthalpy
Crystal structure
Scattering
Ions
Atoms

Keywords

  • UT-Hybrid-D
  • sputter deposition
  • interfaces
  • scaling law
  • transition metals
  • low energy ion scattering
  • intermixing
  • thin film growth
  • segregation

Cite this

@article{03e2966ce5e84a19966d42e074fb9f3c,
title = "Nanoscale Transition Metal Thin Films: Growth Characteristics and Scaling Law for Interlayer Formation",
abstract = "A comprehensive study on the growth of nanoscale transition metal-on-transition metal (TM-on-TM) systems is presented. The near room-temperature intermixing and segregation phenomena during growth are studied in vacuo using high-sensitivity low-energy ion scattering. The investigated TM-on-TM systems are classified into four types according to the observed intermixing and segregation behavior. Empirical rules are suggested to qualitatively predict the growth characteristics of any TM-on-TM system based on the atomic size difference, surface-energy difference, and enthalpy of mixing between the film and substrate atoms. An exponential trend is observed in the effective interface width as a function of the surface-energy difference between the film and substrate layers, with a subtrend based on the crystal structure of the TM layers. A semiempirical model that accurately describes the experimental data is presented. It serves as a scaling law to predict the effective interface width and the minimum film thickness required for full film coverage in TM-on-TM systems in general. The ability to predict the growth characteristics as well as the interface width for any TM-on-TM system significantly contributes to the process of finding the best material combination for a specific application, where layer growth characteristics are implicitly considered when selecting materials based on their functional properties.",
keywords = "UT-Hybrid-D, sputter deposition, interfaces, scaling law, transition metals, low energy ion scattering, intermixing, thin film growth, segregation",
author = "Anirudhan Chandrasekaran and {van de Kruijs}, {Robbert W.E.} and J.M. Sturm and Andrey Zameshin and F. Bijkerk",
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journal = "ACS applied materials & interfaces",
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publisher = "American Chemical Society",
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}

Nanoscale Transition Metal Thin Films : Growth Characteristics and Scaling Law for Interlayer Formation. / Chandrasekaran, Anirudhan ; van de Kruijs, Robbert W.E.; Sturm, J.M.; Zameshin, Andrey ; Bijkerk, F.

In: ACS applied materials & interfaces, Vol. 11, No. 49, 11.12.2019, p. 46311−46326.

Research output: Contribution to journalArticleAcademicpeer-review

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AU - Chandrasekaran, Anirudhan

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AU - Zameshin, Andrey

AU - Bijkerk, F.

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