The deposition of thin films of inorganic nanoclusters as a route to one-step lithography has been achieved using block copolymers with inherent inorganic (Fe and Si) components. Nanodomains of the organometallic part are resistant to removal during the subsequent O2 etch, which results in well-ordered and separate domains of iron and silicon oxides, as can be seen in the Figure.
|Publication status||Published - 2000|
- reactive ion
- Thin Films
- Block copolymers
Lammertink, R. G. H., Hempenius, M. A., van den Enk, J. E., Chan, V. Z. H., Thomas, E. L., & Vancso, G. J. (2000). Nanostructured thin films of organic-organometallic block copolymers: one-step lithography with poly(ferrocenylsilanes) by reactive ion etching. Advanced materials, 12(2), 98-103. https://doi.org/10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5