Nanostructured thin films of organic-organometallic block copolymers: one-step lithography with poly(ferrocenylsilanes) by reactive ion etching

Rob G.H. Lammertink, Mark A. Hempenius, J.E. van den Enk, V.Z.H. Chan, E.L. Thomas, Gyula J. Vancso

Research output: Contribution to journalArticleAcademicpeer-review

190 Citations (Scopus)

Abstract

The deposition of thin films of inorganic nanoclusters as a route to one-step lithography has been achieved using block copolymers with inherent inorganic (Fe and Si) components. Nanodomains of the organometallic part are resistant to removal during the subsequent O2 etch, which results in well-ordered and separate domains of iron and silicon oxides, as can be seen in the Figure.
Original languageUndefined
Pages (from-to)98-103
JournalAdvanced materials
Volume12
Issue number2
DOIs
Publication statusPublished - 2000

Keywords

  • METIS-106411
  • IR-71627
  • reactive ion
  • Thin Films
  • One-step
  • Poly(ferrocenylsilanes)
  • organic-inorganic
  • nanostructured
  • Etching
  • Lithography
  • Block copolymers

Cite this