Nanostructured thin films of organic-organometallic block copolymers: one-step lithography with poly(ferrocenylsilanes) by reactive ion etching

Rob G.H. Lammertink, Mark A. Hempenius, J.E. van den Enk, V.Z.H. Chan, E.L. Thomas, Gyula J. Vancso

Research output: Contribution to journal › Article › Academic › peer-review

200 Citations (Scopus)
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