Narrow-Linewidth Distributed Feedback Channel Waveguide Laser in Al2O3:Er3+

Edward Bernhardi, L. Agazzi, Kerstin Worhoff, R.M. de Ridder, Markus Pollnau

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    Abstract

    We report on the fabrication and characterization of a distributed feedback channel waveguide laser in erbium-doped aluminium oxide on a standard thermally oxidized silicon substrate. Holographically-written surface-relief Bragg gratings have been integrated with the aluminium oxide waveguides via reactive ion etching of a silicon dioxide overlay film. The laser operates at a wavelength of 1545.2 nm and exhibits a threshold of 2.2 mW absorbed pump power, while it produces a maximum output power of 3 mW. The emission is TE polarized and has a Lorentzian linewidth of 1.70±0.58 kHz, which corresponds to a Q-factor of 1.14×E11.
    Original languageUndefined
    Title of host publicationProceedings of the 2010 Annual Symposium of the IEEE Photonics Benelux Chapter
    EditorsJ. Pozo, M. Mortensen, P. Urbach, X Leijtens, M. Yousefi
    Place of PublicationDelft, The Netherlands
    PublisherIEEE Photonics Benelux Chapter
    Pages85-88
    Number of pages4
    ISBN (Print)978-90-78314-15-8
    Publication statusPublished - 18 Nov 2010
    Event15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010 - Delft, Netherlands
    Duration: 18 Nov 201019 Nov 2010
    Conference number: 15

    Publication series

    Name
    PublisherIEEE Photonics Benelux Chapter

    Conference

    Conference15th Annual Symposium of the IEEE Photonics Benelux Chapter 2010
    CountryNetherlands
    CityDelft
    Period18/11/1019/11/10

    Keywords

    • METIS-275701
    • EWI-18790
    • IOMS-APD: Active Photonic Devices
    • IR-74614

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