Negative differential resistance of TEMPO molecules on Si(111)

A.S.V.M. Hallbäck; Bene Poelsema; Henricus J.W. Zandvliet

doi:10.1016/j.apsusc.2006.09.003

Negative differential resistance of TEMPO molecules on Si(111)

A.S.V.M. Hallbäck, Bene Poelsema, Henricus J.W. Zandvliet

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Abstract

Negative differential resistance (NDR) has been observed for individual 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) molecules on Si(1 1 1) in ultra high vacuum (UHV) scanning tunneling microscopy (STM) and spectroscopy (STS) measurements at room temperature. NDR effects were observed exclusively at negative bias voltage using an n-type Si(1 1 1) sample. At 77 K no NDR effects were observed, but the I(V) curves were similar in shape to those recorded on bare Si(1 1 1) sites. TEMPO was observed to adsorb preferentially at corner adatom sites of the Si(1 1 1)-7 × 7 structure. Although the Si(1 1 1)-7 × 7 reconstruction was conserved, local defects were frequently observed in the vicinity of the TEMPO adsorbates.

Original language	Undefined
Pages (from-to)	4066-4071
Number of pages	6
Journal	Applied surface science
Volume	253
Issue number	8
DOIs	https://doi.org/10.1016/j.apsusc.2006.09.003
Publication status	Published - 2007

Keywords

IR-73060
METIS-234203

Access to Document

10.1016/j.apsusc.2006.09.003

Cite this

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title = "Negative differential resistance of TEMPO molecules on Si(111)",

abstract = "Negative differential resistance (NDR) has been observed for individual 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) molecules on Si(1 1 1) in ultra high vacuum (UHV) scanning tunneling microscopy (STM) and spectroscopy (STS) measurements at room temperature. NDR effects were observed exclusively at negative bias voltage using an n-type Si(1 1 1) sample. At 77 K no NDR effects were observed, but the I(V) curves were similar in shape to those recorded on bare Si(1 1 1) sites. TEMPO was observed to adsorb preferentially at corner adatom sites of the Si(1 1 1)-7 × 7 structure. Although the Si(1 1 1)-7 × 7 reconstruction was conserved, local defects were frequently observed in the vicinity of the TEMPO adsorbates.",

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TY - JOUR

T1 - Negative differential resistance of TEMPO molecules on Si(111)

AU - Hallbäck, A.S.V.M.

AU - Poelsema, Bene

AU - Zandvliet, Henricus J.W.

PY - 2007

Y1 - 2007

N2 - Negative differential resistance (NDR) has been observed for individual 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) molecules on Si(1 1 1) in ultra high vacuum (UHV) scanning tunneling microscopy (STM) and spectroscopy (STS) measurements at room temperature. NDR effects were observed exclusively at negative bias voltage using an n-type Si(1 1 1) sample. At 77 K no NDR effects were observed, but the I(V) curves were similar in shape to those recorded on bare Si(1 1 1) sites. TEMPO was observed to adsorb preferentially at corner adatom sites of the Si(1 1 1)-7 × 7 structure. Although the Si(1 1 1)-7 × 7 reconstruction was conserved, local defects were frequently observed in the vicinity of the TEMPO adsorbates.

AB - Negative differential resistance (NDR) has been observed for individual 2,2,6,6-tetramethyl-1-piperidinyloxy (TEMPO) molecules on Si(1 1 1) in ultra high vacuum (UHV) scanning tunneling microscopy (STM) and spectroscopy (STS) measurements at room temperature. NDR effects were observed exclusively at negative bias voltage using an n-type Si(1 1 1) sample. At 77 K no NDR effects were observed, but the I(V) curves were similar in shape to those recorded on bare Si(1 1 1) sites. TEMPO was observed to adsorb preferentially at corner adatom sites of the Si(1 1 1)-7 × 7 structure. Although the Si(1 1 1)-7 × 7 reconstruction was conserved, local defects were frequently observed in the vicinity of the TEMPO adsorbates.

KW - IR-73060

KW - METIS-234203

U2 - 10.1016/j.apsusc.2006.09.003

DO - 10.1016/j.apsusc.2006.09.003

M3 - Article

SN - 0169-4332

VL - 253

SP - 4066

EP - 4071

JO - Applied surface science

JF - Applied surface science

IS - 8

ER -