Network parameter fitting of orientation dependent etching of silicon

E. van Veenendaal, J. van Suchtelen, K. Sato, W.J.P. van Enckevort, Michael Curt Elwenspoek

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationHolten
    Publication statusPublished - 18 May 1998

    Keywords

    • METIS-114704

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