Network parameter fitting of orientation dependent etching of silicon

E. van Veenendaal, J. van Suchtelen, K. Sato, W.J.P. van Enckevort, Michael Curt Elwenspoek

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationHolten
    Publication statusPublished - 18 May 1998

    Keywords

    • METIS-114704

    Cite this

    van Veenendaal, E., van Suchtelen, J., Sato, K., van Enckevort, W. J. P., & Elwenspoek, M. C. (1998, May 18). Network parameter fitting of orientation dependent etching of silicon. Holten.