Network parameter fitting of orientation dependent etching of silicon

E. van Veenendaal, J. van Suchtelen, K. Sato, W.J.P. van Enckevort, Michael Curt Elwenspoek

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationHolten
    Publication statusPublished - 18 May 1998

    Keywords

    • METIS-114704

    Cite this

    van Veenendaal, E., van Suchtelen, J., Sato, K., van Enckevort, W. J. P., & Elwenspoek, M. C. (1998, May 18). Network parameter fitting of orientation dependent etching of silicon. Holten.
    van Veenendaal, E. ; van Suchtelen, J. ; Sato, K. ; van Enckevort, W.J.P. ; Elwenspoek, Michael Curt. / Network parameter fitting of orientation dependent etching of silicon. 1998. Holten.
    @misc{39943f1635bb497fb237f5157c487d3e,
    title = "Network parameter fitting of orientation dependent etching of silicon",
    keywords = "METIS-114704",
    author = "{van Veenendaal}, E. and {van Suchtelen}, J. and K. Sato and {van Enckevort}, W.J.P. and Elwenspoek, {Michael Curt}",
    year = "1998",
    month = "5",
    day = "18",
    language = "Undefined",
    type = "Other",

    }

    van Veenendaal, E, van Suchtelen, J, Sato, K, van Enckevort, WJP & Elwenspoek, MC 1998, Network parameter fitting of orientation dependent etching of silicon. Holten.

    Network parameter fitting of orientation dependent etching of silicon. / van Veenendaal, E.; van Suchtelen, J.; Sato, K.; van Enckevort, W.J.P.; Elwenspoek, Michael Curt.

    Holten. 1998, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Network parameter fitting of orientation dependent etching of silicon

    AU - van Veenendaal, E.

    AU - van Suchtelen, J.

    AU - Sato, K.

    AU - van Enckevort, W.J.P.

    AU - Elwenspoek, Michael Curt

    PY - 1998/5/18

    Y1 - 1998/5/18

    KW - METIS-114704

    M3 - Other contribution

    CY - Holten

    ER -

    van Veenendaal E, van Suchtelen J, Sato K, van Enckevort WJP, Elwenspoek MC. Network parameter fitting of orientation dependent etching of silicon. 1998.