Skip to main navigation Skip to search Skip to main content

Network parameter fitting of orientation dependent etching of silicon

  • E. van Veenendaal
  • , J. van Suchtelen
  • , K. Sato
  • , W.J.P. van Enckevort
  • , Michael Curt Elwenspoek

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationHolten
    Publication statusPublished - 18 May 1998

    Keywords

    • METIS-114704

    Cite this