Network parameter fitting of orientation dependent etching of silicon

E. van Veenendaal; J. van Suchtelen; K. Sato; A.J. Nijdam; Johannes G.E. Gardeniers; W.J.P. van Enckevort; Michael Curt Elwenspoek

Network parameter fitting of orientation dependent etching of silicon

E. van Veenendaal
, J. van Suchtelen
, K. Sato
, A.J. Nijdam
, Johannes G.E. Gardeniers
, W.J.P. van Enckevort
, Michael Curt Elwenspoek

Research output: Other contribution › Other research output

Original language	Undefined
Place of Publication	Enschede
Publication status	Published - 23 Jun 1998

Keywords

METIS-114640

Cite this

@misc{9b398fb60ad2419aae06b59a735a9663,

title = "Network parameter fitting of orientation dependent etching of silicon",

keywords = "METIS-114640",

author = "\{van Veenendaal\}, E. and \{van Suchtelen\}, J. and K. Sato and A.J. Nijdam and Gardeniers, \{Johannes G.E.\} and \{van Enckevort\}, W.J.P. and Elwenspoek, \{Michael Curt\}",

year = "1998",

month = jun,

day = "23",

language = "Undefined",

type = "Other",

}