New process for high optical quality InAs quantum dots grown on patterned GaAs(001) substrates

Pablo Alonso-González, Luisa González, Yolanda González, David Fuster, Ivan Fernández-Martinez, Javier Martin-Sánchez, Leon Abelmann

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    26 Citations (Scopus)
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    Abstract

    This work presents a selective ultraviolet (UV)-ozone oxidation-chemical etching process that has been used, in combination with laser interference lithography (LIL), for the preparation of GaAs patterned substrates. Further molecular beam epitaxy (MBE) growth of InAs results in ordered InAs/GaAs quantum dot (QD) arrays with high optical quality from the first layer of QDs formed on the patterned substrate. The main result is the development of a patterning technology that allows the engineering of customized geometrical displays of QDs with the same optical quality as those formed spontaneously on flat non-patterned substrates.
    Original languageEnglish
    Pages (from-to)355302
    Number of pages4
    JournalNanotechnology
    Volume18
    Issue number35
    DOIs
    Publication statusPublished - 7 Aug 2007

    Keywords

    • TST-LIL: Laser Interference Lithography
    • TST-SMI: Formerly in EWI-SMI

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