New process for high optical quality InAs quantum dots grown on patterned GaAs(001) substrates

Pablo Alonso-González, Luisa González, Yolanda González, David Fuster, Ivan Fernández-Martinez, Javier Martin-Sánchez, Leon Abelmann

    Research output: Contribution to journalArticleAcademicpeer-review

    26 Citations (Scopus)


    This work presents a selective ultraviolet (UV)-ozone oxidation-chemical etching process that has been used, in combination with laser interference lithography (LIL), for the preparation of GaAs patterned substrates. Further molecular beam epitaxy (MBE) growth of InAs results in ordered InAs/GaAs quantum dot (QD) arrays with high optical quality from the first layer of QDs formed on the patterned substrate. The main result is the development of a patterning technology that allows the engineering of customized geometrical displays of QDs with the same optical quality as those formed spontaneously on flat non-patterned substrates.
    Original languageUndefined
    Article number10.1088/0957-4484/18/35/355302
    Pages (from-to)355302
    Number of pages4
    Issue numberLNCS4549/35
    Publication statusPublished - 7 Aug 2007


    • EWI-10778
    • TST-LIL: Laser Interference Lithography
    • TST-SMI: Formerly in EWI-SMI
    • METIS-241786
    • IR-61851

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