This work presents a selective ultraviolet (UV)-ozone oxidation-chemical etching process that has been used, in combination with laser interference lithography (LIL), for the preparation of GaAs patterned substrates. Further molecular beam epitaxy (MBE) growth of InAs results in ordered InAs/GaAs quantum dot (QD) arrays with high optical quality from the first layer of QDs formed on the patterned substrate. The main result is the development of a patterning technology that allows the engineering of customized geometrical displays of QDs with the same optical quality as those formed spontaneously on flat non-patterned substrates.
- TST-LIL: Laser Interference Lithography
- TST-SMI: Formerly in EWI-SMI
Alonso-González, P., González, L., González, Y., Fuster, D., Fernández-Martinez, I., Martin-Sánchez, J., & Abelmann, L. (2007). New process for high optical quality InAs quantum dots grown on patterned GaAs(001) substrates. Nanotechnology, 18(LNCS4549/35), 355302. [10.1088/0957-4484/18/35/355302]. https://doi.org/10.1088/0957-4484/18/35/355302