Nitridation and contrast of B4C/La interfaces and multilayer optics

Research output: Contribution to journalArticleAcademicpeer-review

25 Citations (Scopus)

Abstract

Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7 < λ < 7.0 nm.
Original languageEnglish
Pages (from-to)7249-7252
Number of pages4
JournalThin solid films
Volume518
Issue number24
DOIs
Publication statusPublished - 2010

Fingerprint

Nitridation
Optics
Multilayers
X ray optics
optics
Nanoelectronics
Surface-Active Agents
Surface active agents
geometrical optics
interlayers
Substrates
surfactants
reflectance
electronics
x rays
interactions

Keywords

  • METIS-270381

Cite this

@article{e9700ed82f4e4400b7318df90fca1ff3,
title = "Nitridation and contrast of B4C/La interfaces and multilayer optics",
abstract = "Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7 < λ < 7.0 nm.",
keywords = "METIS-270381",
author = "T. Tsarfati and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and E. Zoethout and Eric Louis and Frederik Bijkerk",
year = "2010",
doi = "10.1016/j.tsf.2010.04.088",
language = "English",
volume = "518",
pages = "7249--7252",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
number = "24",

}

Nitridation and contrast of B4C/La interfaces and multilayer optics. / Tsarfati, T.; van de Kruijs, Robbert Wilhelmus Elisabeth; Zoethout, E.; Louis, Eric; Bijkerk, Frederik.

In: Thin solid films, Vol. 518, No. 24, 2010, p. 7249-7252.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Nitridation and contrast of B4C/La interfaces and multilayer optics

AU - Tsarfati, T.

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Zoethout, E.

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2010

Y1 - 2010

N2 - Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7 < λ < 7.0 nm.

AB - Chemical diffusion and interlayer formation in thin layers and at interfaces is of increasing influence in nanoscopic devices such as nano-electronics, magneto-optical storage and multilayer X-ray optics. We show that with the nitridation of reactive B4C/La interfaces, both the chemical and optical contrast can be greatly enhanced. Although interaction and diffusion of N2 from the substrate towards the adlayer does occur, this surfactant mediated growth contributes to chemical and optical interface properties that enable major reflectivity improvements of multilayer optics for 6.7 < λ < 7.0 nm.

KW - METIS-270381

U2 - 10.1016/j.tsf.2010.04.088

DO - 10.1016/j.tsf.2010.04.088

M3 - Article

VL - 518

SP - 7249

EP - 7252

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

IS - 24

ER -